P

Inventor

UCHIDA YOHEI

JP30 patents
⚠️ This page may combine multiple inventors who share the name “UCHIDA YOHEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

17 patents
USD992614SJul 18, 2023

Focus ring

TOKYO ELECTRON LTD24 citations94
USD992615SJul 18, 2023

Focus ring

TOKYO ELECTRON LTD25 citations91
US11501995B2Nov 15, 2022

Plasma processing apparatus and mounting table thereof

TOKYO ELECTRON LTD7 citations86
US12293937B2May 6, 2025

Plasma processing apparatus and mounting table thereof

TOKYO ELECTRON LTD2 citations75
US12046457B2Jul 23, 2024

Electrostatic chuck, focus ring, support base, plasma processing apparatus, and plasma processing method

TOKYO ELECTRON LTD2 citations73
US10199241B2Feb 5, 2019

Gas supply device and substrate processing apparatus

TOKYO ELECTRON LTD2 citations73
US9887108B2Feb 6, 2018

Gas supply device and substrate processing apparatus

TOKYO ELECTRON LTD5 citations73
US11032899B2Jun 8, 2021

Plasma processing apparatus and plasma processing method

TOKYO ELECTRON LTD4 citations71
US11495445B2Nov 8, 2022

Plasma processing apparatus and plasma processing method

TOKYO ELECTRON LTD1 citations62
US10886108B2Jan 5, 2021

Power feed structure and plasma processing apparatus

TOKYO ELECTRON LTD1 citations62
US11942357B2Mar 26, 2024

Workpiece placement apparatus and processing apparatus

TOKYO ELECTRON LTD0 citations60
US11825589B2Nov 21, 2023

Plasma processing apparatus and plasma processing method

TOKYO ELECTRON LTD0 citations60
US11410871B2Aug 9, 2022

Workpiece placement apparatus and processing apparatus

TOKYO ELECTRON LTD0 citations60
US11600471B2Mar 7, 2023

Substrate support, plasma processing apparatus, and focus ring

TOKYO ELECTRON LTD0 citations52
US11984300B2May 14, 2024

Plasma processing apparatus

TOKYO ELECTRON LTD0 citations50
US9209060B2Dec 8, 2015

Mounting table structure and method of holding focus ring

TOKYO ELECTRON LTD0 citations41
US10847348B2Nov 24, 2020

Plasma processing apparatus and plasma processing method

TOKYO ELECTRON LTD0 citations37

FURUKAWA ELECTRIC CO LTD

3 patents

UCHIDA YOHEI

2 patents

SHINKAWA KK

2 patents

KAO CORP

2 patents

HIROSE JUN

1 patent

ULVAC INC

1 patent

MASUDA TAKESHI

1 patent

HANGAI TOMOHIRO

1 patent