Inventor
TAKASE TAIRA
JP17 patents
⚠️ This page may combine multiple inventors who share the name “TAKASE TAIRA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
15 patentsUS7166200B2Jan 23, 2007
Method and apparatus for an improved upper electrode plate in a plasma processing system
TOKYO ELECTRON LTD49 citations96
US7163585B2Jan 16, 2007
Method and apparatus for an improved optical window deposition shield in a plasma processing system
TOKYO ELECTRON LTD56 citations96
US6798519B2Sep 28, 2004
Method and apparatus for an improved optical window deposition shield in a plasma processing system
TOKYO ELECTRON LTD44 citations96
US7811428B2Oct 12, 2010
Method and apparatus for an improved optical window deposition shield in a plasma processing system
TOKYO ELECTRON LTD14 citations92
US7204912B2Apr 17, 2007
Method and apparatus for an improved bellows shield in a plasma processing system
TOKYO ELECTRON LTD23 citations92
US7166166B2Jan 23, 2007
Method and apparatus for an improved baffle plate in a plasma processing system
TOKYO ELECTRON LTD40 citations92
US7137353B2Nov 21, 2006
Method and apparatus for an improved deposition shield in a plasma processing system
TOKYO ELECTRON LTD32 citations92
US6790289B2Sep 14, 2004
Method of cleaning a plasma processing apparatus
TOKYO ELECTRON LTD22 citations92
US7678226B2Mar 16, 2010
Method and apparatus for an improved bellows shield in a plasma processing system
TOKYO ELECTRON LTD15 citations84
US7566368B2Jul 28, 2009
Method and apparatus for an improved upper electrode plate in a plasma processing system
TOKYO ELECTRON LTD13 citations84
US11032899B2Jun 8, 2021
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD4 citations71
US11705356B2Jul 18, 2023
Mounting table and plasma processing apparatus
TOKYO ELECTRON LTD0 citations62
US10727101B2Jul 28, 2020
Mounting table and plasma processing apparatus
TOKYO ELECTRON LTD1 citations62
US11825589B2Nov 21, 2023
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD0 citations60
US7585385B2Sep 8, 2009
Plasma processing apparatus, control method thereof and program for performing same
TOKYO ELECTRON LTD0 citations42