Inventor

HUANG HSU-TING

TW40 patents

⚠️ This page may combine multiple inventors who share the name “HUANG HSU-TING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HUANG HSU-TING

TAIWAN SEMICONDUCTOR MFG CO LTD

System and method for pattern correction in e-beam lithography

Mask process correction

Method for mask data synthesis with wafer target adjustment

Lithography model calibration

Method of mask simulation model for OPC and mask making

Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device

Lithography simulation method

Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device

Source beam optimization method for improving lithography printability

Generating final mask pattern by performing inverse beam technology process

Photo mask data correction method

Method of mask data synthesis and mask making

Test pattern generation systems and methods

Lithography simulation method

Method of mask data synthesis and mask making

Photolithography method and apparatus

Test pattern generation systems and methods

Method of manufacturing integrated circuit

Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device

Test pattern generation systems and methods

Method of mask data synthesis and mask making

Photo mask data correction method

Method of mask simulation model for OPC and mask making

Source beam optimization method for improving lithography printability

Method for mask data synthesis with wafer target adjustment

Method for mask data synthesis with wafer target adjustment

Importing and exporting circuit layouts

Photolithography method and apparatus

Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device

Photo mask data correction method

Methods of making mask using transmission cross coefficient (TCC) matrix of lithography process optical system

TOKYO ELECTRON LTD

Diffracting, aperiodic targets for overlay metrology and method to detect gross overlay

Apparatus and method for measuring overlay by diffraction gratings

Measurement of overlay using diffraction gratings when overlay exceeds the grating period

CADENCE DESIGN SYSTEMS INC

Apparatus and method for compensating a lithography projection tool

Apparatus and method for photomask design

Apparatus and method for segmenting edges for optical proximity correction

SEZGINER ABDURRAHMAN

System and method for calibrating a lithography model

Apparatus and method for segmenting edges for optical proximity correction

INVARIUM INC

Apparatus and method for characterizing an image system in lithography projection tool