Inventor

YU SHENG-KANG

TW54 patents

⚠️ This page may combine multiple inventors who share the name “YU SHENG-KANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YU SHENG-KANG

TAIWAN SEMICONDUCTOR MFG CO LTD

System and method for dynamically controlling temperature of thermostatic reticles

Positioning device for aligning semiconductor tool and overhead hoist transport system

Method and apparatus for removing debris from collector

Lithography apparatus and method

System and method for omnidirectional real time detection of photolithography characteristics

Method and apparatus for mitigating tin debris

Methods of cleaning a lithography system

EUV light source and apparatus for lithography

Radiation source apparatus and method for using the same

System for a semiconductor fabrication facility and method for operating the same

Method for creating vacuum in load lock chamber

System and method for omnidirectional real time detection of photolithography characteristics

Semiconductor processing tool and methods of operation

Lithography system and methods

Lithography system and methods

EUV light source contamination monitoring system

EUV lithography apparatus

Semiconductor processing tool and methods of operation

EUV lithography apparatus

EUV lithography system with 3D sensing and tunning modules

Semiconductor processing tool and methods of operation

EUV radiation source apparatus for lithography

Semiconductor processing tool and methods of operation

Semiconductor processing tool and method of using the same

Lithography apparatus and method

Inspection system for extreme ultraviolet (EUV) light source

Methods of cleaning a lithography system

System and method for dynamically controlling temperature of thermostatic reticles

Device and method to remove debris from an extreme ultraviolet (EUV) lithography system

Reticle cleaning device and method of use

EUV vessel perimeter flow auto adjustment

Method for using radiation source apparatus

Lithography thermal control

System for a semiconductor fabrication facility and method for operating the same

EUV lithography system with 3D sensing and tunning modules

Device and method to remove debris from an extreme ultraviolet (EUV) lithography system

EUV vessel perimeter flow auto adjustment

Reticle cleaning device and method of use

Lithography thermal control

Inspection system for extreme ultraviolet (EUV) light source

Semiconductor processing tool and methods of operation

EUV radiation source apparatus for lithography

Method of operating semiconductor apparatus and semiconductor apparatus

Acoustic particle deflection in lithography tool

Inspection tool for an extreme ultraviolet radiation source to observe tin residual

Acoustic particle deflection in lithography tool

Apparatus and method for prevention of contamination on collector of extreme ultraviolet light source

Radiation source apparatus and method for using the same

Radiation source apparatus and method for using the same

CHEN YU CHIH

EUV radiation source apparatus for lithography