Inventor
SAKAMOTO KIICHI
JP50 patents
⚠️ This page may combine multiple inventors who share the name “SAKAMOTO KIICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJITSU LTD
49 patentsUS5260579ANov 9, 1993
Charged particle beam exposure system and charged particle beam exposure method
FUJITSU LTD167 citations99
US6222195B1Apr 24, 2001
Charged-particle-beam exposure device and charged-particle-beam exposure method
FUJITSU LTD49 citations96
US5262341ANov 16, 1993
Blanking aperture array and charged particle beam exposure method
FUJITSU LTD66 citations96
US5173582ADec 22, 1992
Charged particle beam lithography system and method
FUJITSU LTD63 citations96
US5144142ASep 1, 1992
Blanking aperture array, method for producing blanking aperture array, charged particle beam exposure apparatus and charged particle beam exposure method
FUJITSU LTD78 citations96
US5422491AJun 6, 1995
Mask and charged particle beam exposure method using the mask
FUJITSU LTD26 citations93
US5364718ANov 15, 1994
Method of exposing patttern of semiconductor devices and stencil mask for carrying out same
FUJITSU LTD37 citations93
US5288567AFeb 22, 1994
Stencil mask and charged particle beam exposure method and apparatus using the stencil mask
FUJITSU LTD24 citations93
US5276331AJan 4, 1994
Electron beam exposure system
FUJITSU LTD24 citations93
US5051556ASep 24, 1991
Charged particle beam lithography system and a method thereof
FUJITSU LTD43 citations93
US6242751B1Jun 5, 2001
Charged-particle-beam exposure device and charged-particle-beam exposure method
FUJITSU LTD33 citations92
US6137111AOct 24, 2000
Charged particle-beam exposure device and charged-particle-beam exposure method
FUJITSU LTD26 citations92
US6090527AJul 18, 2000
Electron beam exposure mask and method of manufacturing the same and electron beam exposure method
FUJITSU LTD25 citations92
US5969365AOct 19, 1999
Charged-particle-beam exposure device and charged-particle-beam exposure method
FUJITSU LTD20 citations92
US5849437ADec 15, 1998
Electron beam exposure mask and method of manufacturing the same and electron beam exposure method
FUJITSU LTD24 citations92
US5830612ANov 3, 1998
Method of detecting a deficiency in a charged-particle-beam exposure mask
FUJITSU LTD28 citations92
US5757015AMay 26, 1998
Charged-particle-beam exposure device and charged-particle-beam exposure method
FUJITSU LTD25 citations92
US5719402AFeb 17, 1998
Method of and system for charged particle beam exposure
FUJITSU LTD32 citations92
US5546319AAug 13, 1996
Method of and system for charged particle beam exposure
FUJITSU LTD21 citations92
US5401974AMar 28, 1995
Charged particle beam exposure apparatus and method of cleaning the same
FUJITSU LTD47 citations92
US5391886AFeb 21, 1995
Charged particle beam exposure system and method of exposing a pattern on an object by such a charged particle beam exposure system
FUJITSU LTD36 citations92
US5036209AJul 30, 1991
Fabrication method for semiconductor devices and transparent mask for charged particle beam
FUJITSU LTD39 citations92
US4980567ADec 25, 1990
Charged particle beam exposure system using line beams
FUJITSU LTD34 citations92
US5965895AOct 12, 1999
Method of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposure
FUJITSU LTD13 citations82
US5721432AFeb 24, 1998
Method of and system for charged particle beam exposure
FUJITSU LTD16 citations82
US5376802ADec 27, 1994
Stencil mask and charge particle beam exposure method and apparatus using the stencil mask
FUJITSU LTD17 citations82
US5347592ASep 13, 1994
Pattern judging method and mask producing method using the pattern judging method
FUJITSU LTD19 citations82
US5256881AOct 26, 1993
Mask and charged particle beam exposure method using the mask
FUJITSU LTD20 citations82
US5234781AAug 10, 1993
Mask for lithographic patterning and a method of manufacturing the same
FUJITSU LTD20 citations82
US4954717ASep 4, 1990
Photoelectron mask and photo cathode image projection method using the same
FUJITSU LTD21 citations81
US5590048ADec 31, 1996
Block exposure pattern data extracting system and method for charged particle beam exposure
FUJITSU LTD12 citations74
US5432314AJul 11, 1995
Transparent mask plate for charged particle beam exposure apparatus and charged particle beam exposure process using the transparent mask plate
FUJITSU LTD10 citations74
US5393988AFeb 28, 1995
Mask and charged particle beam exposure method using the mask
FUJITSU LTD19 citations74
US5349197ASep 20, 1994
Method for exposing a pattern on an object by a charged particle beam
FUJITSU LTD13 citations74
US5276334AJan 4, 1994
Charged particle beam exposure method and apparatus
FUJITSU LTD7 citations74
US5223719AJun 29, 1993
Mask for use in a charged particle beam apparatus including beam passing sections
FUJITSU LTD7 citations74
US5180919AJan 19, 1993
Electron beam exposure system having the capability of checking the pattern of an electron mask used for shaping an electron beam
FUJITSU LTD10 citations74
US5175435ADec 29, 1992
Electron beam exposure system with increased efficiency of exposure operation
FUJITSU LTD14 citations74
US5148033ASep 15, 1992
Electron beam exposure device and exposure method using the same
FUJITSU LTD19 citations74
US5130547AJul 14, 1992
Charged-particle beam exposure method and apparatus
FUJITSU LTD8 citations74
US5117117AMay 26, 1992
Electron beam exposure system having an improved seal element for interfacing electric connections
FUJITSU LTD9 citations74
US5952155ASep 14, 1999
Mask and method of creating mask as well as electron-beam exposure method and electron-beam exposure device
FUJITSU LTD10 citations73
US5824437AOct 20, 1998
Mask and method of creating mask as well as electron-beam exposure method and electron-beam exposure device
FUJITSU LTD6 citations73
US5537487AJul 16, 1996
Pattern judging method, mask producing method, and method of dividing block pattern for use in block exposure
FUJITSU LTD16 citations73
US5225684AJul 6, 1993
Charged particle beam exposure apparatus control system and a method of operation for providing a drawing start signal
FUJITSU LTD12 citations73
US5194741AMar 16, 1993
Method for writing a pattern on an object by a focused electron beam with an improved efficiency
FUJITSU LTD9 citations73
US5118952AJun 2, 1992
Patterned photo cathode and its fabrication method for electron image projection
FUJITSU LTD12 citations73
US5029222AJul 2, 1991
Photoelectron image projection apparatus
FUJITSU LTD7 citations73
US5023462AJun 11, 1991
Photo-cathode image projection apparatus for patterning a semiconductor device
FUJITSU LTD19 citations73