Inventor
NEMANI SRINIVAS
US36 patents
⚠️ This page may combine multiple inventors who share the name “NEMANI SRINIVAS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
32 patentsUS6465366B1Oct 15, 2002
Dual frequency plasma enhanced chemical vapor deposition of silicon carbide layers
APPLIED MATERIALS INC315 citations99
US6413583B1Jul 2, 2002
Formation of a liquid-like silica layer by reaction of an organosilicon compound and a hydroxyl forming compound
APPLIED MATERIALS INC725 citations99
US6347636B1Feb 19, 2002
Methods and apparatus for gettering fluorine from chamber material surfaces
APPLIED MATERIALS INC579 citations99
US6114216ASep 5, 2000
Methods for shallow trench isolation
APPLIED MATERIALS INC230 citations99
US5963840AOct 5, 1999
Methods for depositing premetal dielectric layer at sub-atmospheric and high temperature conditions
APPLIED MATERIALS INC200 citations99
US5935340AAug 10, 1999
Method and apparatus for gettering fluorine from chamber material surfaces
APPLIED MATERIALS INC206 citations99
US5812403ASep 22, 1998
Methods and apparatus for cleaning surfaces in a substrate processing system
APPLIED MATERIALS INC459 citations99
US10923367B2Feb 16, 2021
Process chamber for etching low K and other dielectric films
APPLIED MATERIALS INC41 citations98
US9287095B2Mar 15, 2016
Semiconductor system assemblies and methods of operation
APPLIED MATERIALS INC153 citations98
US6537733B2Mar 25, 2003
Method of depositing low dielectric constant silicon carbide layers
APPLIED MATERIALS INC292 citations98
US6352591B1Mar 5, 2002
Methods and apparatus for shallow trench isolation
APPLIED MATERIALS INC112 citations98
US9865484B1Jan 9, 2018
Selective etch using material modification and RF pulsing
APPLIED MATERIALS INC109 citations97
US6348099B1Feb 19, 2002
Methods and apparatus for depositing premetal dielectric layer at sub-atmospheric and high temperature conditions
APPLIED MATERIALS INC71 citations96
US7200460B2Apr 3, 2007
Method of depositing low dielectric constant silicon carbide layers
APPLIED MATERIALS INC17 citations92
US10675581B2Jun 9, 2020
Gas abatement apparatus
APPLIED MATERIALS INC19 citations91
US6090206AJul 18, 2000
Throttle valve providing enhanced cleaning
APPLIED MATERIALS INC34 citations91
US10790183B2Sep 29, 2020
Selective oxidation for 3D device isolation
APPLIED MATERIALS INC14 citations85
US9666414B2May 30, 2017
Process chamber for etching low k and other dielectric films
APPLIED MATERIALS INC9 citations84
US7176105B2Feb 13, 2007
Dielectric gap fill with oxide selectively deposited over silicon liner
APPLIED MATERIALS INC14 citations84
US6589888B2Jul 8, 2003
Dual frequency plasma enhanced chemical vapor deposition of silicon carbide layers
APPLIED MATERIALS INC14 citations84
US10096466B2Oct 9, 2018
Pulsed plasma for film deposition
APPLIED MATERIALS INC4 citations73
US6855484B2Feb 15, 2005
Method of depositing low dielectric constant silicon carbide layers
APPLIED MATERIALS INC10 citations73
US10943779B2Mar 9, 2021
Method and system for three-dimensional (3D) structure fill
APPLIED MATERIALS INC2 citations72
US10475655B2Nov 12, 2019
Selective deposition of metal silicides
APPLIED MATERIALS INC2 citations70
US10096496B2Oct 9, 2018
Process chamber for etching low K and other dielectric films
APPLIED MATERIALS INC1 citations63
US12057329B2Aug 6, 2024
Selective etch using material modification and RF pulsing
APPLIED MATERIALS INC0 citations62
US11410860B2Aug 9, 2022
Process chamber for etching low k and other dielectric films
APPLIED MATERIALS INC0 citations62
US10964527B2Mar 30, 2021
Residual removal
APPLIED MATERIALS INC0 citations62
US11110383B2Sep 7, 2021
Gas abatement apparatus
APPLIED MATERIALS INC0 citations59
US6511924B2Jan 28, 2003
Method of forming a silicon oxide layer on a substrate
APPLIED MATERIALS INC5 citations58
US10549324B2Feb 4, 2020
Method and apparatus for backside cleaning of substrates
APPLIED MATERIALS INC0 citations51
US12305279B2May 20, 2025
Ultra high-k hafnium oxide and hafnium zirconium oxide films
APPLIED MATERIALS INC0 citations45