Inventor
STRAUCH GERD
DE7 patents
Patents
7 patentsUS6849241B2Feb 1, 2005
Device and method for depositing one or more layers on a substrate
AIXTRON AG401 citations96
US7294207B2Nov 13, 2007
Gas-admission element for CVD processes, and device
AIXTRON AG32 citations91
US6309465B1Oct 30, 2001
CVD reactor
AIXTRON AG49 citations91
US6786973B2Sep 7, 2004
Method for depositing in particular crystalline layers, gas-admission element and device for carrying out the method
AIXTRON AG25 citations90
US7201942B2Apr 10, 2007
Coating method
AIXTRON AG17 citations80
US7056388B2Jun 6, 2006
Reaction chamber with at least one HF feedthrough
AIXTRON AG4 citations58
US7473316B1Jan 6, 2009
Method of growing nitrogenous semiconductor crystal materials
AIXTRON AG3 citations55