Inventor

HAGGART JR DAVID WESTON

US2 patents

Patents

2 patents

US6589099B2Jul 8, 2003

Method for chemical mechanical polishing (CMP) with altering the concentration of oxidizing agent in slurry

MOTOROLA INC19 citations89

US6593238B1Jul 15, 2003

Method for determining an endpoint and semiconductor wafer

MOTOROLA INC7 citations69