P

Inventor

GLASHAUSER WALTER

DE14 patents
⚠️ This page may combine multiple inventors who share the name “GLASHAUSER WALTER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IBM

3 patents
US6103592AAug 15, 2000

Manufacturing self-aligned polysilicon fet devices isolated with maskless shallow trench isolation and gate conductor fill technology with active devices and dummy doped regions formed in mesas

IBM68 citations94
US5804490ASep 8, 1998

Method of filling shallow trenches

IBM27 citations91
US6974770B2Dec 13, 2005

Self-aligned mask to reduce cell layout area

IBM10 citations73

INFINEON TECHNOLOGIES AG

3 patents
US6812141B1Nov 2, 2004

Recessed metal lines for protective enclosure in integrated circuits

INFINEON TECHNOLOGIES AG39 citations92
US7070479B2Jul 4, 2006

Arrangement and method for conditioning a polishing pad

INFINEON TECHNOLOGIES AG41 citations86
US7097535B2Aug 29, 2006

Method and configuration for conditioning a polishing pad surface

INFINEON TECHNOLOGIES AG9 citations68

INFINEON TECHNOLOGIES SC300

2 patents
US6739013B2May 25, 2004

Wafer cleaning apparatus

INFINEON TECHNOLOGIES SC30022 citations89
US6824456B2Nov 30, 2004

Configuration for polishing disk-shaped objects

INFINEON TECHNOLOGIES SC30010 citations70

MOTOROLA INC

2 patents
US6375549B1Apr 23, 2002

Polishing head for wafer, and method for polishing

MOTOROLA INC22 citations86
US6593238B1Jul 15, 2003

Method for determining an endpoint and semiconductor wafer

MOTOROLA INC7 citations69

SIEMENS AG

2 patents
US4528071AJul 9, 1985

Process for the production of masks having a metal carrier foil

SIEMENS AG9 citations73
US4393129AJul 12, 1983

Method of stress-free development of irradiated polymethylmetacrylate

SIEMENS AG17 citations66

SEMICONDUCTOR 300 GMBH & CO KG

1 patent
US6419567B1Jul 16, 2002

Retaining ring for chemical-mechanical polishing (CMP) head, polishing apparatus, slurry cycle system, and method

SEMICONDUCTOR 300 GMBH & CO KG48 citations91

INFINEON TECHNOLOGIES SC 300 G

1 patent
US7156933B2Jan 2, 2007

Configuration and method for mounting a backing film to a polish head

INFINEON TECHNOLOGIES SC 300 G1 citations42