Inventor

AL-BAYATI AMIR

US50 patents

⚠️ This page may combine multiple inventors who share the name “AL-BAYATI AMIR”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

AL-BAYATI AMIR

APPLIED MATERIALS INC

Chemical vapor deposition plasma reactor having plural ion shower grids

Semiconductor substrate process using an optically writable carbon-containing mask

Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing

Low temperature CVD process with selected stress of the CVD layer on CMOS devices

Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer

Semiconductor substrate process using a low temperature deposited carbon-containing hard mask

Low temperature plasma deposition process for carbon layer deposition

Copper barrier reflow process employing high speed optical annealing

Chemical vapor deposition plasma process using plural ion shower grids

Chemical vapor deposition plasma process using an ion shower grid

Semiconductor junction formation process including low temperature plasma deposition of an optical absorption layer and high speed optical annealing

Plasma immersion ion implantation reactor having an ion shower grid

RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor

Plasma immersion ion implantation process using a capacitively couple plasma source having low dissociation and low minimum plasma voltage

Silicon-on-insulator wafer transfer method using surface activation plasma immersion ion implantation for wafer-to-wafer adhesion enhancement

Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage

Plasma immersion ion implantation process

Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage

Fabrication of silicon-on-insulator structure using plasma immersion ion implantation

Electrostatic chuck with smart lift-pin mechanism for a plasma reactor

Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer

Integration process for fabricating stressed transistor structure

Plasma immersion ion implantation process

Semiconductor on insulator vertical transistor fabrication and doping process

Plasma immersion ion implantation process

Plasma immersion ion implantation process using a plasma source having low dissociation and low minimum plasma voltage

Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage

Plasma immersion ion implantation process using an inductively coupled plasma source having low dissociation and low minimum plasma voltage

Method, system and medium for controlling semiconductor wafer processes using critical dimension measurements

Method for ion implanting insulator material to reduce dielectric constant

Methods and apparatus of creating airgap in dielectric layers for the reduction of RC delay

Ion beam generation apparatus

Advances in spike anneal processes for ultra shallow junctions

Semiconductor on insulator vertical transistor fabrication and doping process

Gasless high voltage high contact force wafer contact-cooling electrostatic chuck

Method of forming non-volatile memory having charge trap layer with compositional gradient

O-ringless tandem throttle valve for a plasma reactor chamber

Vacuum reaction chamber with x-lamp heater

BALSEANU MIHAELA

Method of forming a non-volatile memory having a silicon nitride charge trap layer

Method of forming flash memory with ultraviolet treatment

JENNINGS DEAN C

Thermal flux annealing influence of buried species

Thermal flux annealing influence of buried species

XU HUIWEN

Method to minimize wet etch undercuts and provide pore sealing of extreme low k (k&lt;2.5) dielectrics

HANAWA HIROJI

Plasma immersion ion implantation reactor having multiple ion shower grids

SHAH ASHISH

Systems for plasma enhanced chemical vapor deposition and bevel edge etching

GRAOUI HOUDA

Method of ion implantation to reduce transient enhanced diffusion

PORSHNEV PETER I

Plasma immersion ion implantation reactor with extended cathode process ring

SCHLEZINGER ASAF

Process and apparatus for measuring the crystal fraction of crystalline silicon casted mono wafers

BALASUBRAMANIAN GANESH

Apparatus and method for substrate clamping in a plasma chamber

SHENG SHURAN

High quality TCO-silicon interface contact structure for high efficiency thin film silicon solar cells

Method to minimize wet etch undercuts and provide pore sealing of extreme low k (k<2.5) dielectrics