Inventor
SIMONS HUBERTUS JOHANNES GERTRUDUS
NL17 patents
⚠️ This page may combine multiple inventors who share the name “SIMONS HUBERTUS JOHANNES GERTRUDUS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
10 patentsUS7880880B2Feb 1, 2011
Alignment systems and methods for lithographic systems
ASML NETHERLANDS BV24 citations95
US7683351B2Mar 23, 2010
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV20 citations92
US9291916B2Mar 22, 2016
Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods
ASML NETHERLANDS BV5 citations83
US11170072B2Nov 9, 2021
Method and apparatus for inspection and metrology
ASML NETHERLANDS BV2 citations70
US7573574B2Aug 11, 2009
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV3 citations63
USRE49460EMar 14, 2023
Inspection method and apparatus and lithographic processing cell
ASML NETHERLANDS BV0 citations60
USRE49199ESep 6, 2022
Inspection method and apparatus and lithographic processing cell
ASML NETHERLANDS BV0 citations60
US8887107B2Nov 11, 2014
Inspection method and apparatus and lithographic processing cell
ASML NETHERLANDS BV2 citations60
US11061336B2Jul 13, 2021
Device manufacturing method
ASML NETHERLANDS BV1 citations58
US9927717B2Mar 27, 2018
Inspection method and apparatus, and lithographic apparatus
ASML NETHERLANDS BV1 citations47
MOS EVERHARDUS CORNELIS
4 patentsUS8706442B2Apr 22, 2014
Alignment system, lithographic system and method
MOS EVERHARDUS CORNELIS89 citations97
US8248579B2Aug 21, 2012
Lithographic apparatus, device manufacturing method and device for correcting overlay errors between overlapping patterns
MOS EVERHARDUS CORNELIS4 citations62
US8237914B2Aug 7, 2012
Process, apparatus, and device for determining intra-field correction to correct overlay errors between overlapping patterns
MOS EVERHARDUS CORNELIS3 citations62
US8504333B2Aug 6, 2013
Method for selecting sample positions on a substrate, method for providing a representation of a model of properties of a substrate, method of providing a representation of the variation of properties of a substrate across the substrate and device manufacturing method
MOS EVERHARDUS CORNELIS0 citations41