Inventor

BAIJENS HUBERTUS ANTONIUS MARINUS

NL2 patents

Patents

2 patents

US7570342B2Aug 4, 2009

Radiation exposure apparatus comprising a gas flushing system

ASML NETHERLANDS BV2 citations54

US7675606B2Mar 9, 2010

Lithographic apparatus and method

ASML NETHERLANDS BV1 citations42