Inventor

TOTZECK MICHAEL

DE59 patents

⚠️ This page may combine multiple inventors who share the name “TOTZECK MICHAEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOTZECK MICHAEL

ZEISS CARL SMT AG

Microlithographic exposure method as well as a projection exposure system for carrying out the method

Microlithographic exposure method as well as a projection exposure system for carrying out the method

Optically polarizing retardation arrangement, and a microlithography projection exposure machine

Optically polarizing retardation arrangement, and microlithography projection exposure machine

Projection exposure apparatus

Method and apparatus for determining the influencing of the state of polarization by an optical system; and an analyser

Method for describing, evaluating and improving optical polarization properties of a microlithographic projection exposure apparatus

Method of determining lens materials for a projection exposure apparatus

Objective with birefringent lenses

Projection exposure apparatus and method for operating the same

Method of optimizing an objective with fluoride crystal lenses, and objective with fluoride crystal lenses

Optical system, in particular illumination system, of a microlithographic projection exposure apparatus

ZEISS CARL SMT GMBH

Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system

Method of operating a projection exposure tool for microlithography

Illumination system or projection lens of a microlithographic exposure system

Method for approximating an influence of an optical system on the state of polarization of optical radiation

Method of operating a projection exposure tool for microlithography

Microlithography illumination system and microlithography illumination optical unit

Projection objective of a microlithographic projection exposure apparatus

TOTZECK MICHAEL

Optical system of a microlithographic projection exposure apparatus

Optimization and matching of optical systems by use of orientation Zernike polynomials

Lithographic apparatus and device manufacturing method

Microlithographic projection exposure apparatus

Optical system of a microlithographic projection exposure apparatus and microlithographic exposure method

Microlithographic projection exposure apparatus

Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection

ZEISS CARL SMS GMBH

Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection

Imaging system for emulation of a high aperture scanning system

Method and apparatus for determining the position of a structure on a carrier relative to a reference point of the carrier

Method for determining intensity distribution in the image plane of a projection exposure arrangement

ZEISS CARL VISION INT GMBH

Spectacle lens and method for producing same

3D printing process for producing a spectacle lens

3D printing apparatus and 3D printing method for manufacturing a workpiece

ZEISS CARL INDUSTRIELLE MESSTECHNIK GMBH

Method and device for additive manufacturing utilizing simulation test results of a workpiece

Material testing by angle-variable illumination

SCHRIEVER MARTIN

Optical apparatus and method for modifying the imaging behavior of such apparatus

PAZIDIS ALEXANDRA

Projection system with compensation of intensity variations and compensation element therefor

FIOLKA DAMIAN

Microlithography illumination system and microlithography illumination optical unit

STROESSNER ULRICH

Method and apparatus for measuring structures on photolithography masks

ZEISS CARL JENA GMBH

Lab-on-a-chip system with functionalized waveguide

ZEISS CARL MEDITEC INC

Inspection of bonding quality of transparent materials using optical coherence tomography

MUELLER RALF

Interference systems for microlithgraphic projection exposure systems

GOEHNERMEIER AKSEL

Projection objective for microlithography with stray light compensation and related methods

MANN HANS-JÜRGEN

Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system

ASML NETHERLANDS BV

Lithographic apparatus and device manufacturing method

ZEISS CARL MICROSCOPY GMBH

Test sample device and test method for an optical microscope with subwavelength resolution

MANN HANS-JUERGEN

Microscope and microscopy method for space-resolved measurement of a predetermined structure, in particular a structure of a lithographic mask

SCHUSTER KARL-HEINZ

Projection objective of a microlithographic projection exposure apparatus

ZEISS CARL AG

Refractive optical component and spectacle lens produced therefrom, method for producing a refractive optical component, computer program product, construction data of a spectacle lens stored on a data medium, device for additive

GRUNER TORALF

Illumination system for a microlithography projection exposure apparatus