Inventor

NOORBAKHSH HAMID

US53 patents

⚠️ This page may combine multiple inventors who share the name “NOORBAKHSH HAMID”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NOORBAKHSH HAMID

APPLIED MATERIALS INC

Gas distribution showerhead for semiconductor processing

Dielectric etch chamber with expanded process window

Gas distribution plate electrode for a plasma reactor

Apparatus for measuring pedestal and substrate temperature in a semiconductor wafer processing system

Chuck having pressurized zones of heat transfer gas

Dielectric etch chamber with expanded process window

Plasma reactor with a tri-magnet plasma confinement apparatus

Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates

Support assembly with thermal expansion compensation

Methods and apparatus for controlling substrate uniformity

Plasma resistant ceramic coated conductive article

Monitoring substrate processing using reflected radiation

Gas distribution plate electrode for a plasma receptor

Chamber having improved gas feed-through and method

Showerhead having an extended detachable gas distribution plate

Showerhead with reduced backside plasma ignition

Edge ring assembly for a substrate support in a plasma processing chamber

Showerhead having a detachable high resistivity gas distribution plate

Electrostatic chuck having thermally isolated zones with minimal crosstalk

Showerhead having a detachable gas distribution plate

L-motion slit door for substrate processing chamber

High power showerhead with recursive gas flow distribution

Ceramic electrostatic chuck having a V-shape seal band

Showerhead with reduced backside plasma ignition

Showerhead having a detachable gas distribution plate

Showerhead having a detachable high resistivity gas distribution plate

Showerhead having a detachable gas distribution plate

Showerhead having a detachable high resistivity gas distribution plate

Electrostatic chuck assembly having a dielectric filler

Methods and apparatus for controlling substrate uniformity

Recursive pumping for symmetrical gas exhaust to control critical dimension uniformity in plasma reactors

Split slit liner door

Extended detachable gas distribution plate and showerhead incorporating same

Methods and apparatus for reducing high voltage arcing in semiconductor process chambers

Temperature controlled secondary electrode for ion control at substrate edge

Electrostatic chuck assembly having a dielectric filler

Electrostatic chuck having thermally isolated zones with minimal crosstalk

L-motion slit door for substrate processing chamber

Methods and apparatus for dechucking wafers

Feedforward temperature control for plasma processing apparatus

Two zone flow cooling plate design with concentric or spiral channel for efficient gas distribution assembly cooling

Seal member

LAM RES CORP

Controlling the temperature of a wafer by varying the pressure of gas between the underside of the wafer and the chuck

Method and apparatus for controlling a temperature of a wafer

MAHADESWARASWAMY CHETAN

Component temperature control by coolant flow control and heater duty cycle control

Feedforward temperature control for plasma processing apparatus

(unassigned)

Magnetic barrier for plasma in chamber exhaust

Magnetic barrier for plasma in chamber exhaust

APPLIED MATERIAL INC

Substrate support with gas feed-through and method

NOORBAKHSH HAMID

Reconfigurable multi-zone gas delivery hardware for substrate processing showerheads