Inventor
LAW SHAO BENG
US19 patents
⚠️ This page may combine multiple inventors who share the name “LAW SHAO BENG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
GLOBALFOUNDRIES INC
18 patentsUS10026687B1Jul 17, 2018
Metal interconnects for super (skip) via integration
GLOBALFOUNDRIES INC20 citations93
US9805972B1Oct 31, 2017
Skip via structures
GLOBALFOUNDRIES INC36 citations93
US10014297B1Jul 3, 2018
Methods of forming integrated circuit structure using extreme ultraviolet photolithography technique and related integrated circuit structure
GLOBALFOUNDRIES INC9 citations84
US9966338B1May 8, 2018
Pre-spacer self-aligned cut formation
GLOBALFOUNDRIES INC5 citations84
US9905424B1Feb 27, 2018
Self-aligned non-mandrel cut formation for tone inversion
GLOBALFOUNDRIES INC16 citations83
US10395926B1Aug 27, 2019
Multiple patterning with mandrel cuts formed using a block mask
GLOBALFOUNDRIES INC11 citations81
US10109526B1Oct 23, 2018
Etch profile control during skip via formation
GLOBALFOUNDRIES INC9 citations80
US10770392B1Sep 8, 2020
Line end structures for semiconductor devices
GLOBALFOUNDRIES INC3 citations72
US10573593B2Feb 25, 2020
Metal interconnects for super (skip) via integration
GLOBALFOUNDRIES INC3 citations72
US10163633B2Dec 25, 2018
Non-mandrel cut formation
GLOBALFOUNDRIES INC3 citations72
US10485111B2Nov 19, 2019
Via and skip via structures
GLOBALFOUNDRIES INC2 citations71
US10236256B2Mar 19, 2019
Pre-spacer self-aligned cut formation
GLOBALFOUNDRIES INC1 citations62
US10199261B1Feb 5, 2019
Via and skip via structures
GLOBALFOUNDRIES INC1 citations61
US10636656B2Apr 28, 2020
Methods of protecting structure of integrated circuit from rework
GLOBALFOUNDRIES INC0 citations52
US10056291B2Aug 21, 2018
Post spacer self-aligned cuts
GLOBALFOUNDRIES INC1 citations51
US10056292B2Aug 21, 2018
Self-aligned lithographic patterning
GLOBALFOUNDRIES INC0 citations51
US10627720B2Apr 21, 2020
Overlay mark structures
GLOBALFOUNDRIES INC0 citations42
US10741495B2Aug 11, 2020
Structure and method to reduce shorts and contact resistance in semiconductor devices
GLOBALFOUNDRIES INC0 citations34