Inventor

VOGT MIRKO

DE41 patents

⚠️ This page may combine multiple inventors who share the name “VOGT MIRKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

VOGT MIRKO

INFINEON TECHNOLOGIES AG

Plasma-enhanced chemical vapour deposition process for depositing silicon nitride or silicon oxynitride, process for producing one such layer arrangement, and layer arrangement

Capacitive microelectromechanical device and method for forming a capacitive microelectromechanical device

Capacitive microelectromechanical device and method for forming a capacitive microelectromechanical device

Light emitter devices, optical filter structures and methods for forming light emitter devices and optical filter structures

Method for fabricating a contact hole plane in a memory module

Process for producing a mask on a substrate

Capacitive microelectromechanical device and method for forming a capacitive microelectromechanical device

Light emitter devices, optical filter structures and methods for forming light emitter devices and optical filter structures

Method for manufacturing an integrated circuit and an integrated circuit

Photolithographic patterning process using a carbon hard mask layer of diamond-like hardness produced by a plasma-enhanced deposition process

Method for fabricating a patterned layer on a semiconductor substrate

Graded-index structure for optical systems

Graded-index structure for optical systems

Method for producing a structured layer on a semiconductor substrate

Producing a buried cavity in a semiconductor substrate

Method of generating a germanium structure and optical device comprising a germanium structure

Process for producing an etching mask on a microstructure, in particular a semiconductor structure with trench capacitors, and corresponding use of the etching mask

Fabrication method for semiconductor structure in a substrate, the semiconductor structure having at least two regions that are to be patterned differently

INFINEON TECHNOLOGIES DRESDEN GMBH

Micromechanical system and method for manufacturing a micromechanical system

Systems and methods for horizontal integration of acceleration sensor structures

Sensor structures, systems and methods with improved integration and optimized footprint

Microelectromechanical device, method for manufacturing a microelectromechanical device, and method for manufacturing a system on chip using a CMOS process

Method for manufacturing a micromechanical system

Emitter and method for manufacturing the same

Emitter and method for manufacturing the same

Method and structure for creating cavities with extreme aspect ratios

Integrated semiconductor device and manufacturing method

Sensor structures, systems and methods with improved integration and optimized footprint

Integrated semiconductor device and manufacturing method

Sensor structures, systems and methods with improved integration and optimized footprint

Pressure sensor device and manufacturing method

Method and structure for creating cavities with extreme aspect ratios

Method of forming a resonator

Microelectromechanical resonators

Method for manufacturing a micromechanical system comprising a removal of sacrificial material through a hole in a margin region

INFINEON TECH DRESDEN GMBH & CO KG

Stressed decoupled micro-electro-mechanical system sensor

Microelectromechanical device, method for manufacturing a microelectromechanical device, and method for manufacturing a system on chip using a CMOS process

Microlens having a carrier-free optical interference filter

QIMONDA AG

Integrated circuit having a metal element

Integrated circuit, intermediate structure and a method of fabricating a semiconductor structure

SIEMENS AG

Method for fabricating a semiconductor structure