Inventor

SIVARAMAKRISHNAN VISWESWAREN

US80 patents

⚠️ This page may combine multiple inventors who share the name “SIVARAMAKRISHNAN VISWESWAREN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SIVARAMAKRISHNAN VISWESWAREN

APPLIED MATERIALS INC

Methods and apparatus for gettering fluorine from chamber material surfaces

Method and apparatus for gettering fluorine from chamber material surfaces

Method for depositing low K SI-O-F films using SIF4 /oxygen chemistry

Chamber liner for high temperature processing chamber

Heater/lift assembly for high temperature processing chamber

Lid assembly for high temperature processing chamber

Chemical vapor deposition reactor system and integrated circuit

Vaporizing reactant liquids for chemical vapor deposition film processing

Liquid delivery system

Systems and methods for detecting end of chamber clean in a thermal (non-plasma) process

Tunable ground planes in plasma chambers

Substrate heater assembly

Method and apparatus for creating strong interface between in-situ SACVD and PECVD silicon oxide films

Vaporizing reactant liquids for chemical vapor deposition film processing

Multiple substrate processing apparatus for enhanced throughput

Liquid phosphorous precursor delivery apparatus

Method for in-situ liquid flow rate estimation and verification

Method for in-situ liquid flow rate estimation and verification

In-situ liquid flow rate estimation and verification by sonic flow method

Liquid precursors for the CVD deposition of amorphous carbon films

Method and apparatus for monitoring the position of a semiconductor processing robot

Method and apparatus for forming a thin polymer layer on an integrated circuit structure

Apparatus for creating strong interface between in-situ SACVD and PECVD silicon oxide films

High pressure release device for semiconductor fabricating equipment

Silicon carbide constant voltage gradient gas feedthrough

Rotary reactor for uniform particle coating with thin films

Rotary reactor for uniform particle coating with thin films

Method for depositing an amorphous carbon film with improved density and step coverage

Method of improving initiation layer for low-k dielectric film by digital liquid flow meter

Apparatus for reducing entrapment of foreign matter along a moveable shaft of a substrate support

Vaporizing reactant liquids for chemical vapor deposition film processing

Vaporizing reactant liquids for chemical vapor deposition film processing

Liquid phosphorous precursor delivery apparatus

Method and apparatus for laser drilling blind vias

Patterned vacuum chuck for double-sided processing

Apparatus for vaporization sequence for multiple liquid precursors used in semiconductor thin film applications

Apparatus for reducing entrapment of foreign matter along a moveable shaft of a substrate support

Direct liquid injection system for thin film deposition

Method and system for supplying a cleaning gas into a process chamber

Method of improving initiation layer for low-k dielectric film by digital liquid flow meter

Methods to improve the in-film defectivity of PECVD amorphous carbon films

SIVARAMAKRISHNAN VISWESWAREN

Silicon wafers by epitaxial deposition

High throughput multi-wafer epitaxial reactor

High throughput multi-wafer epitaxial reactor

SVAGOS TECHNIK INC

Process chamber with resistive heating

CVD reactor chamber with resistive heating for silicon carbide deposition

CVD reactor chamber with resistive heating and substrate holder

Crystal Solar Incorporated

High throughput multi-wafer epitaxial reactor

SHAH ASHISH

Systems for plasma enhanced chemical vapor deposition and bevel edge etching

PADHI DEENESH

Methods to improve the in-film defectivity of PECVD amorphous carbon films