Inventor
HSIEH MIN-YANN
TW26 patents
⚠️ This page may combine multiple inventors who share the name “HSIEH MIN-YANN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
24 patentsUS10074558B1Sep 11, 2018
FinFET structure with controlled air gaps
TAIWAN SEMICONDUCTOR MFG CO LTD18 citations94
US9882023B2Jan 30, 2018
Sidewall spacers for self-aligned contacts
TAIWAN SEMICONDUCTOR MFG CO LTD16 citations91
US10872980B2Dec 22, 2020
Semiconductor device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US10553481B2Feb 4, 2020
Vias for cobalt-based interconnects and methods of fabrication thereof
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US9941125B2Apr 10, 2018
Method for integrated circuit patterning
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations82
US10516030B2Dec 24, 2019
Contact plugs and methods forming same
TAIWAN SEMICONDUCTOR MFG CO LTD10 citations81
US11908735B2Feb 20, 2024
Vias for cobalt-based interconnects and methods of fabrication thereof
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11721763B2Aug 8, 2023
Semiconductor device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11282751B2Mar 22, 2022
Dielectric fins with different dielectric constants and sizes in different regions of a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10727061B2Jul 28, 2020
Method for integrated circuit patterning
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations71
US10930752B2Feb 23, 2021
Contact plugs and methods forming same
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations70
US12588498B2Mar 24, 2026
FinFET structure with controlled air gaps
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12453164B2Oct 21, 2025
Dielectric fins with different dielectric constants and sizes in different regions of a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12288822B2Apr 29, 2025
Semiconductor device with source/drain contact
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11804402B2Oct 31, 2023
FinFET structure with controlled air gaps
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11404309B2Aug 2, 2022
Vias for cobalt-based interconnects and methods of fabrication thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11251181B2Feb 15, 2022
FinFET isolation structure and method for fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12464751B2Nov 4, 2025
Contact plugs and methods forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US11862708B2Jan 2, 2024
Contact plugs and methods forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US11152355B2Oct 19, 2021
Structure with embedded memory device and contact isolation scheme
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations56
US10879110B2Dec 29, 2020
FinFET structure with controlled air gaps
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10510751B2Dec 17, 2019
FinFET isolation structure and method for fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10332786B2Jun 25, 2019
Method for manufacturing a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10366982B2Jul 30, 2019
Structure with embedded memory device and contact isolation scheme
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations45