P

Inventor

KUMAR BHASKAR

US27 patents
⚠️ This page may combine multiple inventors who share the name “KUMAR BHASKAR”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

25 patents
US9646876B2May 9, 2017

Aluminum nitride barrier layer

APPLIED MATERIALS INC9 citations83
US10748797B2Aug 18, 2020

Plasma parameters and skew characterization by high speed imaging

APPLIED MATERIALS INC2 citations72
US10074559B1Sep 11, 2018

Selective poreseal deposition prevention and residue removal using SAM

APPLIED MATERIALS INC5 citations72
US11069514B2Jul 20, 2021

Remote capacitively coupled plasma source with improved ion blocker

APPLIED MATERIALS INC3 citations71
US11721545B2Aug 8, 2023

Method of using dual frequency RF power in a process chamber

APPLIED MATERIALS INC2 citations70
US11488811B2Nov 1, 2022

Chucking process and system for substrate processing chambers

APPLIED MATERIALS INC2 citations70
US11699585B2Jul 11, 2023

Methods of forming hardmasks

APPLIED MATERIALS INC0 citations62
US9252392B2Feb 2, 2016

Thin film encapsulation-thin ultra high barrier layer for OLED application

APPLIED MATERIALS INC2 citations62
US11996273B2May 28, 2024

Methods of seasoning process chambers

APPLIED MATERIALS INC0 citations61
US11859275B2Jan 2, 2024

Techniques to improve adhesion and defects for tungsten carbide film

APPLIED MATERIALS INC0 citations61
US11545376B2Jan 3, 2023

Plasma parameters and skew characterization by high speed imaging

APPLIED MATERIALS INC0 citations61
US11495440B2Nov 8, 2022

Plasma density control on substrate edge

APPLIED MATERIALS INC0 citations61
US11120976B2Sep 14, 2021

Apparatus and methods for removing contaminant particles in a plasma process

APPLIED MATERIALS INC0 citations61
US10892143B2Jan 12, 2021

Technique to prevent aluminum fluoride build up on the heater

APPLIED MATERIALS INC1 citations61
US12106958B2Oct 1, 2024

Method of using dual frequency RF power in a process chamber

APPLIED MATERIALS INC0 citations60
US12020911B2Jun 25, 2024

Chucking process and system for substrate processing chambers

APPLIED MATERIALS INC0 citations60
US11515191B2Nov 29, 2022

Graded dimple height pattern on heater for lower backside damage and low chucking voltage

APPLIED MATERIALS INC0 citations60
US12460298B2Nov 4, 2025

Showerhead design to control stray deposition

APPLIED MATERIALS INC0 citations59
US11959174B2Apr 16, 2024

Shunt door for magnets in plasma process chamber

APPLIED MATERIALS INC1 citations59
US12142468B2Nov 12, 2024

Stress treatments for cover wafers

APPLIED MATERIALS INC0 citations58
US9780223B2Oct 3, 2017

Gallium arsenide based materials used in thin film transistor applications

APPLIED MATERIALS INC1 citations52
US10714319B2Jul 14, 2020

Apparatus and methods for removing contaminant particles in a plasma process

APPLIED MATERIALS INC0 citations51
US9793108B2Oct 17, 2017

Interconnect integration for sidewall pore seal and via cleanliness

APPLIED MATERIALS INC1 citations51
US10790121B2Sep 29, 2020

Plasma density control on substrate edge

APPLIED MATERIALS INC0 citations50
US10688538B2Jun 23, 2020

Aluminum fluoride mitigation by plasma treatment

APPLIED MATERIALS INC0 citations40

SINGH KAUSHAL K

1 patent

SHENG SHURAN

1 patent