Inventor
KUMAR BHASKAR
US27 patents
⚠️ This page may combine multiple inventors who share the name “KUMAR BHASKAR”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
25 patentsUS9646876B2May 9, 2017
Aluminum nitride barrier layer
APPLIED MATERIALS INC9 citations83
US10748797B2Aug 18, 2020
Plasma parameters and skew characterization by high speed imaging
APPLIED MATERIALS INC2 citations72
US10074559B1Sep 11, 2018
Selective poreseal deposition prevention and residue removal using SAM
APPLIED MATERIALS INC5 citations72
US11069514B2Jul 20, 2021
Remote capacitively coupled plasma source with improved ion blocker
APPLIED MATERIALS INC3 citations71
US11721545B2Aug 8, 2023
Method of using dual frequency RF power in a process chamber
APPLIED MATERIALS INC2 citations70
US11488811B2Nov 1, 2022
Chucking process and system for substrate processing chambers
APPLIED MATERIALS INC2 citations70
US11699585B2Jul 11, 2023
Methods of forming hardmasks
APPLIED MATERIALS INC0 citations62
US9252392B2Feb 2, 2016
Thin film encapsulation-thin ultra high barrier layer for OLED application
APPLIED MATERIALS INC2 citations62
US11996273B2May 28, 2024
Methods of seasoning process chambers
APPLIED MATERIALS INC0 citations61
US11859275B2Jan 2, 2024
Techniques to improve adhesion and defects for tungsten carbide film
APPLIED MATERIALS INC0 citations61
US11545376B2Jan 3, 2023
Plasma parameters and skew characterization by high speed imaging
APPLIED MATERIALS INC0 citations61
US11495440B2Nov 8, 2022
Plasma density control on substrate edge
APPLIED MATERIALS INC0 citations61
US11120976B2Sep 14, 2021
Apparatus and methods for removing contaminant particles in a plasma process
APPLIED MATERIALS INC0 citations61
US10892143B2Jan 12, 2021
Technique to prevent aluminum fluoride build up on the heater
APPLIED MATERIALS INC1 citations61
US12106958B2Oct 1, 2024
Method of using dual frequency RF power in a process chamber
APPLIED MATERIALS INC0 citations60
US12020911B2Jun 25, 2024
Chucking process and system for substrate processing chambers
APPLIED MATERIALS INC0 citations60
US11515191B2Nov 29, 2022
Graded dimple height pattern on heater for lower backside damage and low chucking voltage
APPLIED MATERIALS INC0 citations60
US12460298B2Nov 4, 2025
Showerhead design to control stray deposition
APPLIED MATERIALS INC0 citations59
US11959174B2Apr 16, 2024
Shunt door for magnets in plasma process chamber
APPLIED MATERIALS INC1 citations59
US12142468B2Nov 12, 2024
Stress treatments for cover wafers
APPLIED MATERIALS INC0 citations58
US9780223B2Oct 3, 2017
Gallium arsenide based materials used in thin film transistor applications
APPLIED MATERIALS INC1 citations52
US10714319B2Jul 14, 2020
Apparatus and methods for removing contaminant particles in a plasma process
APPLIED MATERIALS INC0 citations51
US9793108B2Oct 17, 2017
Interconnect integration for sidewall pore seal and via cleanliness
APPLIED MATERIALS INC1 citations51
US10790121B2Sep 29, 2020
Plasma density control on substrate edge
APPLIED MATERIALS INC0 citations50
US10688538B2Jun 23, 2020
Aluminum fluoride mitigation by plasma treatment
APPLIED MATERIALS INC0 citations40