Inventor
LIAO CHUN-HUNG
TW26 patents
⚠️ This page may combine multiple inventors who share the name “LIAO CHUN-HUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
21 patentsUS11495471B2Nov 8, 2022
Slurry compositions for chemical mechanical planarization
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11267987B2Mar 8, 2022
Chemical mechanical polishing slurry composition and method of polishing metal layer
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US12538791B2Jan 27, 2026
Source/drain contact for semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12441912B2Oct 14, 2025
Chemical mechanical polishing slurry composition and method of polishing metal layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12261055B2Mar 25, 2025
Slurry compositions for chemical mechanical planarization
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12176217B2Dec 24, 2024
Method for manufacturing a semiconductor using slurry
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12024651B2Jul 2, 2024
Chemical mechanical polishing slurry composition and method of polishing metal layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11752592B2Sep 12, 2023
Slurry enhancement for polishing system
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11756825B2Sep 12, 2023
Semiconductor structure with oxidized ruthenium
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11735470B2Aug 22, 2023
Method for forming semiconductor device structure with source/drain contact
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11688607B2Jun 27, 2023
Slurry
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11525072B2Dec 13, 2022
Materials and methods for chemical mechanical polishing of ruthenium-containing materials
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10920105B2Feb 16, 2021
Materials and methods for chemical mechanical polishing of ruthenium-containing materials
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12431431B2Sep 30, 2025
Conductive structure interconnects with downward projections
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12269141B2Apr 8, 2025
Fabrication of a polishing pad for chemical mechanical polishing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11697183B2Jul 11, 2023
Fabrication of a polishing pad for chemical mechanical polishing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12489063B2Dec 2, 2025
Semiconductor device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10964549B2Mar 30, 2021
Wafer polishing with separated chemical reaction and mechanical polishing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10847410B2Nov 24, 2020
Ruthenium-containing semiconductor structure and method of manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10727076B2Jul 28, 2020
Slurry and manufacturing semiconductor using the slurry
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US12347735B2Jul 1, 2025
In-situ defect count detection in post chemical mechanical polishing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50