Inventor
YAMANAKA EIJI
JP28 patents
⚠️ This page may combine multiple inventors who share the name “YAMANAKA EIJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
BRIDGESTONE CORP
6 patentsUS5753365AMay 19, 1998
Rubber composition and all season type pneumatic tires made from a rubber composition
BRIDGESTONE CORP21 citations90
US5968295AOct 19, 1999
Pneumatic radial tires with circumferential cord belt layer having specified cord twisting structure
BRIDGESTONE CORP9 citations72
US6330897B1Dec 18, 2001
Pneumatic tire containing a vulcanization accelerator
BRIDGESTONE CORP13 citations69
US6386257B1May 14, 2002
Pneumatic radial tires with circumferential cord belt layer having specified cord twisting structure
BRIDGESTONE CORP3 citations61
US6382287B1May 7, 2002
Pneumatic radial tires with circumferential cord belt layer having specified cord twisting structure
BRIDGESTONE CORP1 citations61
US6279634B1Aug 28, 2001
Pneumatic radial tires with circumferential cord belt layer having specified cord twisting structure
BRIDGESTONE CORP3 citations61
NIPPON PAINT CO LTD
6 patentsUS5187306AFeb 16, 1993
Process for producing unsaturated carbamic acid esters
NIPPON PAINT CO LTD8 citations74
US5892100AApr 6, 1999
Method for producing N-acyl carbamate
NIPPON PAINT CO LTD7 citations73
US5348991ASep 20, 1994
Aqueous dispersion coating composition
NIPPON PAINT CO LTD9 citations72
US5606096AFeb 25, 1997
Production of unsaturated carbamic acid derivative
NIPPON PAINT CO LTD5 citations63
US5434296AJul 18, 1995
Process for producing unsaturated carbamic acid esters
NIPPON PAINT CO LTD1 citations52
US6083563AJul 4, 2000
Method of forming a chipping-resistant composite paint film
NIPPON PAINT CO LTD0 citations41
TOSHIBA KK
5 patentsUS7673281B2Mar 2, 2010
Pattern evaluation method and evaluation apparatus and pattern evaluation program
TOSHIBA KK21 citations92
US7454051B2Nov 18, 2008
Method of manufacturing photo mask, mask pattern shape evaluation apparatus, method of judging photo mask defect corrected portion, photo mask defect corrected portion judgment apparatus, and method of manufacturing a semiconductor device
TOSHIBA KK11 citations84
US7313781B2Dec 25, 2007
Image data correction method, lithography simulation method, image data correction system, program, mask and method of manufacturing a semiconductor device
TOSHIBA KK14 citations83
US5602645AFeb 11, 1997
Pattern evaluation apparatus and a method of pattern evaluation
TOSHIBA KK12 citations72
US7831085B2Nov 9, 2010
Method of manufacturing photo mask, mask pattern shape evaluation apparatus, method of judging photo mask defect corrected portion, photo mask defect corrected portion judgment apparatus, and method of manufacturing a semiconductor device
TOSHIBA KK3 citations63
JAPAN NATIONAL RAILWAY
2 patentsBRIDGESTONE SPORTS CO LTD
2 patentsYAMANAKA EIJI
2 patentsUS8873830B2Oct 28, 2014
Method for extracting contour of pattern on photo mask, contour extraction apparatus, method for guaranteeing photo mask, and method for manufacturing semiconductor device
YAMANAKA EIJI6 citations71
US8299402B2Oct 30, 2012
Disassemblable structure, electric equipment and non-electric equipment having disassemblable structure, and disassembling method
YAMANAKA EIJI2 citations56