Inventor

KASHIDA MEGURU

JP45 patents

⚠️ This page may combine multiple inventors who share the name “KASHIDA MEGURU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KASHIDA MEGURU

SHINETSU CHEMICAL CO

Frame-supported pellicle for photomask protection

Silicon-silicon oxide-lithium composite, making method, and non-aqueous electrolyte secondary cell negative electrode material

Pellicle with a filter and method for production thereof

Frame-supported dustproof pellicle for photolithographic photomask

Frame-supported pellicle for photolithography

Pellicle for photolithographic mask

Curable organopolysiloxane composition

Frame-supported pellicle for dustproof protection of photomask in photolithography

Pellicle for protection of photolithographic mask

Frame-supported pellicle for dustproof protection of photomask

Membrane consisting of silicon carbide and silicon nitride, method for the preparation thereof and mask for X-ray lithography utilizing the same

Film-forming on substrate by sputtering

Curable silicone composition

Method for imparting releasability to a substrate surface

Frame-supported pellicle for dustproof protection of photomask

Cyclic carbonate-modified siloxane, method of making, non-aqueous electrolytic solution, secondary battery, and capacitor

Non-aqueous electrolytic solution and secondary battery

Frame-supported pellicle for photolithography, comprising a fluorocarbon containing organopolysiloxane based adhesive

Non-aqueous electrolytic solution and battery

Pellicle for a mask or substrate

Frame-supported pellicle for photolithography

Frame-supported pellicle for protection of photolithographic mask

Method for the preparation of a frame-supported pellicle for photolithography

X-ray transmitting membrane for mask in x-ray lithography and method for preparing the same

X-ray permeable membrane for X-ray lithographic mask

X-ray lithographic mask blank with reinforcement

Magneto-optical recording medium

Silicone composition for rendering surfaces non-adherent

Jig for producing pellicle and method for producing pellicle using the same

Frame-supported pellicle for dustproof protection of photomask

High-packing silicon nitride powder and method for making

Non-aqueous electrolytic solution, secondary battery, and electrochemical capacitor

End surface-protected frame-supported pellicle for photolithography

Method for the preparation of a frame-supported pellicle for photolithography

Method for the preparation of a resin membrane

Method for dust-proofing in the manufacture of electronic devices and pellicle therefor

X-ray permeable membrane for X-ray lithographic mask

Method for the preparation of a silicon carbide-silicon nitride composite membrane for x-ray lithography

Silicon carbide membrane for x-ray lithography and method for the prepartion thereof

Sheets with silicone-based surface-release film

High-packing silicon nitride powder and method for making

Sintered silicon oxide for film vapor deposition, its production method, and method for producing silicon oxide vapor deposition film

Cyclic carbonate-modified organosilicon compound, non-aqueous electrolytic solution, secondary battery and capacitor

ARAMATA MIKIO

Separator for non-aqueous secondary battery, making method, and non-aqueous electrolyte secondary battery

FUKUOKA HIROFUMI

Sintered silicon oxide for film vapor deposition, its production method, and method for producing silicon oxide vapor deposition film