P

Inventor

ABE MASAHIRO

JP167 patents
⚠️ This page may combine multiple inventors who share the name “ABE MASAHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOSHIBA KK

17 patents
US5266526ANov 30, 1993

Method of forming trench buried wiring for semiconductor device

TOSHIBA KK511 citations99
US4618878AOct 21, 1986

Semiconductor device having a multilayer wiring structure using a polyimide resin

TOSHIBA KK268 citations99
US6167583B1Jan 2, 2001

Double side cleaning apparatus for semiconductor substrate

TOSHIBA KK101 citations98
US5055906AOct 8, 1991

Semiconductor device having a composite insulating interlayer

TOSHIBA KK67 citations95
US5993639ANov 30, 1999

Method for producing electrolytic ionic water and an apparatus for the same

TOSHIBA KK36 citations93
US6069083AMay 30, 2000

Polishing method, semiconductor device fabrication method, and semiconductor fabrication apparatus

TOSHIBA KK19 citations92
US5968239AOct 19, 1999

Polishing slurry

TOSHIBA KK40 citations92
US5861054AJan 19, 1999

Polishing slurry

TOSHIBA KK40 citations92
US5532520AJul 2, 1996

Semiconductor wafer with alignment marks

TOSHIBA KK36 citations92
US5489337AFeb 6, 1996

Apparatus for applying organic material to semiconductor wafer in which the nozzle opening adjusts in response to data

TOSHIBA KK35 citations92
US5169407ADec 8, 1992

Method of determining end of cleaning of semiconductor manufacturing apparatus

TOSHIBA KK50 citations92
US5100476AMar 31, 1992

Method and apparatus for cleaning semiconductor devices

TOSHIBA KK49 citations92
US5044311ASep 3, 1991

Plasma chemical vapor deposition apparatus

TOSHIBA KK27 citations92
US5016663AMay 21, 1991

Method of determining end of cleaning of semiconductor manufacturing apparatus

TOSHIBA KK39 citations92
US4933063AJun 12, 1990

Sputtering device

TOSHIBA KK31 citations92
US4717682AJan 5, 1988

Method of manufacturing a semiconductor device with conductive trench sidewalls

TOSHIBA KK30 citations92
US4634496AJan 6, 1987

Method for planarizing the surface of an interlayer insulating film in a semiconductor device

TOSHIBA KK52 citations92

HITACHI LTD

12 patents

NGK INSULATORS LTD

9 patents

TOKYO SHIBAURA ELECTRIC CO

4 patents

GLORY KOGYO KK

3 patents

NGK INSULATORS INC

1 patent

DAIHATSU MOTOR CO LTD

1 patent

WASHIZU TOMOYUKI

1 patent

CANON KK

1 patent

NIPPON KOKAN KK

1 patent

Showing the top 50 of 167 patents by PatentIndex Score.