Inventor
ABE TOMOHIKO
JP35 patents
⚠️ This page may combine multiple inventors who share the name “ABE TOMOHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJITSU LTD
23 patentsUS6646275B2Nov 11, 2003
Charged particle beam exposure system and method
FUJITSU LTD43 citations96
US6118129ASep 12, 2000
Method and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elements
FUJITSU LTD30 citations96
US5977548ANov 2, 1999
Charged particle beam exposure system and method
FUJITSU LTD28 citations96
US5841145ANov 24, 1998
Method of and system for exposing pattern on object by charged particle beam
FUJITSU LTD60 citations96
US5614725AMar 25, 1997
Charged particle beam exposure system and method
FUJITSU LTD36 citations96
US5528048AJun 18, 1996
Charged particle beam exposure system and method
FUJITSU LTD47 citations96
US5359202AOct 25, 1994
Electron beam exposure apparatus employing blanking aperture array
FUJITSU LTD23 citations93
US6242751B1Jun 5, 2001
Charged-particle-beam exposure device and charged-particle-beam exposure method
FUJITSU LTD33 citations92
US6055719AMay 2, 2000
Method for manufacturing an electrostatic deflector
FUJITSU LTD22 citations92
US5969365AOct 19, 1999
Charged-particle-beam exposure device and charged-particle-beam exposure method
FUJITSU LTD20 citations92
US5920077AJul 6, 1999
Charged particle beam exposure system
FUJITSU LTD21 citations92
US5770862AJun 23, 1998
Charged particle exposure apparatus, and a charged particle exposure method
FUJITSU LTD20 citations92
US5757015AMay 26, 1998
Charged-particle-beam exposure device and charged-particle-beam exposure method
FUJITSU LTD25 citations92
US5719402AFeb 17, 1998
Method of and system for charged particle beam exposure
FUJITSU LTD32 citations92
US5546319AAug 13, 1996
Method of and system for charged particle beam exposure
FUJITSU LTD21 citations92
US5430304AJul 4, 1995
Blanking aperture array type charged particle beam exposure
FUJITSU LTD45 citations92
US5391886AFeb 21, 1995
Charged particle beam exposure system and method of exposing a pattern on an object by such a charged particle beam exposure system
FUJITSU LTD36 citations92
US5304811AApr 19, 1994
Lithography system using charged-particle beam and method of using the same
FUJITSU LTD23 citations92
US5965895AOct 12, 1999
Method of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposure
FUJITSU LTD13 citations82
US5721432AFeb 24, 1998
Method of and system for charged particle beam exposure
FUJITSU LTD16 citations82
US5949078ASep 7, 1999
Charged-particle-beam exposure device and charged-particle-beam exposure method
FUJITSU LTD16 citations80
US5590048ADec 31, 1996
Block exposure pattern data extracting system and method for charged particle beam exposure
FUJITSU LTD12 citations74
US5872366AFeb 16, 1999
Charged-particle-beam exposure device and charged-particle-beam exposure method
FUJITSU LTD5 citations71
SONY CORP
5 patentsUS4801398AJan 31, 1989
Method of preparing fluorescent material of small particle size
SONY CORP35 citations90
US4469619ASep 4, 1984
Method of manufacturing a green phosphor
SONY CORP35 citations85
US5104573AApr 14, 1992
Green light emitting phosphor
SONY CORP9 citations71
US4252669AFeb 24, 1981
Luminescent material and method of making the same
SONY CORP3 citations60
US6858977B2Feb 22, 2005
Cathode-ray tube and cathode-ray tube manufacturing method
SONY CORP0 citations49
ADVANTEST CORP
3 patentsUS6465796B1Oct 15, 2002
Charge-particle beam lithography system of blanking aperture array type
ADVANTEST CORP33 citations92
US6268606B1Jul 31, 2001
Electrostatic deflector, for electron beam exposure apparatus, with reduced charge-up
ADVANTEST CORP22 citations92
US6509568B1Jan 21, 2003
Electrostatic deflector for electron beam exposure apparatus
ADVANTEST CORP15 citations81