Inventor

ENDO TAKAFUMI

JP79 patents

⚠️ This page may combine multiple inventors who share the name “ENDO TAKAFUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ENDO TAKAFUMI

MITSUBISHI ELECTRIC CORP

Contact image sensor with continuous light source positioned adjacent to detection object

Image sensor having a multi-layered printed circuit board with increased parallel-plate capacitance and method for manufacturing the same

Image sensor

Image reading apparatus

Method and apparatus for resistance adjustment of thick film thermal print heads

Method of manufacturing thermal head

Image sensing apparatus

Image reading device

Plasma display device

Contact-type image sensor module and image reading apparatus using the module

Thermal printer head driving circuit with thermal history based control

Improved method and circuit for historical control of thermal printing

Thermal recording head driving device

Thermal head

Image sensor with a transparent plate having refractive index changing regions

Image reading apparatus

NISSAN CHEMICAL IND LTD

Composition for forming resist underlayer film for EUV lithography

Resist underlayer film-forming composition containing novolac resin reacted with aromatic methylol compound

Resist underlayer film forming composition that contains novolac resin having polynuclear phenol

Resist underlayer film forming composition

Composition for forming highly adhesive resist underlayer film

Resist underlayer film forming composition and method for forming resist pattern

Resist underlayer film-forming composition containing substituted crosslinkable compound

Resist underlayer film-forming composition containing novolac polymer having secondary amino group

Photocrosslinkable group-containing composition for coating stepped substrate

Resist underlayer film-forming composition

Resist underlayer film-forming composition

Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same

Resist underlayer film-forming composition comprising epoxy adduct having long-chain alkyl group

Resist underlayer film-forming composition containing novolac resin to which aromatic vinyl compound is added

Composition for forming underlayer film of self-assembled film including aliphatic polycyclic structure

NISSAN CHEMICAL CORP

Photocurable composition and method for producing semiconductor device

Composition containing a heterocyclic compound having a dicyanostyryl group, for forming a resist underlayer film capable of being wet etched

Composition containing a dicyanostyryl group, for forming a resist underlayer film capable of being wet etched

Resist underlayer film forming composition having a disulfide structure

Photocurable composition and method for producing semiconductor device

Protective film forming composition having an acetal structure

Chemical-resistant protective film forming composition containing hydroxyaryl-terminated polymer

Chemical-resistant protective film forming composition containing hydroxyaryl-terminated polymer

Protective film-forming composition having acetal structure and amide structure

Protective film forming composition having a diol structure

Multi-level substrate coating film-forming composition containing plasma-curable compound based on unsaturated bonds between carbon atoms

SAKAMOTO RIKIMARU

Composition for forming resist underlayer film with reduced outgassing

Resist underlayer film forming composition, and method for forming resist pattern using the same

ENDO TAKAFUMI

Image reading device

FUJITSU LTD

Contact management system and contact management method

MINOBE TADASHI

Image sensing apparatus

UNIPRES CORP

Structure for attaching undercover to vehicle body

TOKIDA NAOYUKI

Image sensor

OHNISHI RYUJI

Resist underlayer film forming composition and method for forming resist pattern using the same