Inventor
KURODA OSAMU
JP73 patents
⚠️ This page may combine multiple inventors who share the name “KURODA OSAMU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
23 patentsUS6161378ADec 19, 2000
Exhaust gas purification apparatus of internal combustion engine and catalyst for purifying exhaust gas internal combustion engine
HITACHI LTD71 citations96
US6045764AApr 4, 2000
Exhaust gas purifying method and catalyst used therefor
HITACHI LTD68 citations96
US5937637AAug 17, 1999
System for purifying exhaust gas for use in an automobile
HITACHI LTD45 citations96
US5388405AFeb 14, 1995
System for purifying exhaust gas for use in an automobile
HITACHI LTD55 citations96
US5791139AAug 11, 1998
Fuel injection control method for an internal-combustion engine provided with NOx reducing catalytic converter and fuel injection controller
HITACHI LTD24 citations93
US6630115B1Oct 7, 2003
Exhaust emission control process for internal combustion engines
HITACHI LTD30 citations92
US6397582B1Jun 4, 2002
Exhaust gas purification apparatus of internal combustion engine and catalyst for purifying exhaust gas of internal combustion engine
HITACHI LTD24 citations92
US6272848B1Aug 14, 2001
Exhaust gas cleaning apparatus and method for internal combustion engine
HITACHI LTD49 citations92
US5968870AOct 19, 1999
Catalyst for purifying exhaust gas from internal combustion engine and purifying method thereof
HITACHI LTD24 citations92
US5577383ANov 26, 1996
Apparatus for controlling internal combustion engine
HITACHI LTD53 citations92
US5560201AOct 1, 1996
System for purifying exhaust gas for use in an automobile
HITACHI LTD23 citations92
US5517820AMay 21, 1996
Exhaust gas purifying apparatus and method for internal combustion engine
HITACHI LTD43 citations92
US5379586AJan 10, 1995
System for controlling oxygen concentration in exhaust gas and exhaust gas cleaning system employing the same
HITACHI LTD39 citations92
US4746437AMay 24, 1988
Method and apparatus for concentration aqueous solution and method and apparatus for recovering temperature
HITACHI LTD31 citations92
US7010910B2Mar 14, 2006
Exhaust gas purification apparatus
HITACHI LTD13 citations83
US4085194AApr 18, 1978
Waste flue gas desulfurizing method
HITACHI LTD26 citations81
US6517784B1Feb 11, 2003
Exhaust gas purifying apparatus for an internal combustion engine
HITACHI LTD8 citations74
US6093377AJul 25, 2000
Removal of nitrogen oxides from exhaust gas using catalyst
HITACHI LTD11 citations74
US4160713AJul 10, 1979
Process for electro-dialysis
HITACHI LTD18 citations74
US6841511B2Jan 11, 2005
Internal combustion engine exhaust gas purification apparatus, exhaust gas purification process and exhaust gas purification catalyst
HITACHI LTD8 citations73
US6305161B1Oct 23, 2001
Method of purifying exhaust gas of internal combustion engine and apparatus thereof
HITACHI LTD12 citations73
US5972828AOct 26, 1999
Method of manufacturing catalyst for cleaning exhaust gas released from internal combustion engine, and catalyst for the same
HITACHI LTD12 citations73
US4311575AJan 19, 1982
Method for high temperature electrodialysis
HITACHI LTD8 citations73
TOKYO ELECTRON LTD
15 patentsUS7387131B2Jun 17, 2008
Processing apparatus and substrate processing method
TOKYO ELECTRON LTD79 citations98
US7332055B2Feb 19, 2008
Substrate processing apparatus
TOKYO ELECTRON LTD42 citations96
US6068002AMay 30, 2000
Cleaning and drying apparatus, wafer processing system and wafer processing method
TOKYO ELECTRON LTD46 citations96
US6009890AJan 4, 2000
Substrate transporting and processing system
TOKYO ELECTRON LTD75 citations96
US6368040B1Apr 9, 2002
Apparatus for and method of transporting substrates to be processed
TOKYO ELECTRON LTD60 citations94
US7543593B2Jun 9, 2009
Substrate processing apparatus
TOKYO ELECTRON LTD32 citations93
US7404407B2Jul 29, 2008
Substrate processing apparatus
TOKYO ELECTRON LTD21 citations93
US7171973B2Feb 6, 2007
Substrate processing apparatus
TOKYO ELECTRON LTD33 citations93
US6857838B2Feb 22, 2005
Substrate processing system with positioning device and substrate positioning method
TOKYO ELECTRON LTD43 citations93
US6811618B2Nov 2, 2004
Liquid processing apparatus and method
TOKYO ELECTRON LTD20 citations93
US6171403B1Jan 9, 2001
Cleaning and drying apparatus, wafer processing system and wafer processing method
TOKYO ELECTRON LTD24 citations92
US6769855B2Aug 3, 2004
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD45 citations87
US7862680B2Jan 4, 2011
Substrate processing apparatus
TOKYO ELECTRON LTD6 citations74
US7108752B2Sep 19, 2006
Liquid processing apparatus and liquid processing method
TOKYO ELECTRON LTD6 citations74
US11869780B2Jan 9, 2024
Substrate liquid processing apparatus
TOKYO ELECTRON LTD2 citations71
SONY CORP
3 patentsUS5559555ASep 24, 1996
Apparatus for performing exposure control pertaining to the luminance level of an object
SONY CORP42 citations96
US5737018AApr 7, 1998
Exposure apparatus and method for vibration control system
SONY CORP23 citations92
US5473374ADec 5, 1995
Exposing apparatus for performing exposure control corresponding to the luminance level of an object
SONY CORP31 citations92
FUJI PHOTO FILM CO LTD
2 patentsFUJITSU LTD
1 patentSANGO CO LTD
1 patentTOYOTA MOTOR CO LTD
1 patentFUJIFILM CORP
1 patentHONDA MOTOR CO LTD
1 patentTOYO TIRE & RUBBER CO
1 patentMINAMIDA JUNYA
1 patentShowing the top 50 of 73 patents by PatentIndex Score.