Inventor
WAKAYAMA HIROYUKI
JP29 patents
⚠️ This page may combine multiple inventors who share the name “WAKAYAMA HIROYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NISSAN CHEMICAL IND LTD
14 patentsUS11022884B2Jun 1, 2021
Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl group
NISSAN CHEMICAL IND LTD2 citations73
US10139729B2Nov 27, 2018
Coating composition for pattern reversal on soc pattern
NISSAN CHEMICAL IND LTD2 citations73
US10000664B2Jun 19, 2018
Underlayer film-forming composition for self-assembled films
NISSAN CHEMICAL IND LTD2 citations73
US10372039B2Aug 6, 2019
Resist underlayer film forming composition containing silicon having ester group
NISSAN CHEMICAL IND LTD1 citations62
US11815815B2Nov 14, 2023
Composition for forming silicon-containing resist underlayer film removable by wet process
NISSAN CHEMICAL IND LTD0 citations52
US11674053B2Jun 13, 2023
Composition for forming underlayer film of self-assembled film including aliphatic polycyclic structure
NISSAN CHEMICAL IND LTD0 citations52
US11488824B2Nov 1, 2022
Method for manufacturing semiconductor device using silicon-containing resist underlayer film forming composition for solvent development
NISSAN CHEMICAL IND LTD0 citations52
US10280328B2May 7, 2019
Bottom layer film-forming composition of self-organizing film containing styrene structure
NISSAN CHEMICAL IND LTD0 citations52
US10082735B2Sep 25, 2018
Silicon-containing resist underlayer film-forming composition having organic group having aliphatic polycyclic structure
NISSAN CHEMICAL IND LTD1 citations52
US9725618B2Aug 8, 2017
Metal-containing resist underlayer film-forming composition containing polyacid
NISSAN CHEMICAL IND LTD1 citations52
US10508181B2Dec 17, 2019
Bottom layer film-formation composition of self-organizing film containing polycyclic organic vinyl compound
NISSAN CHEMICAL IND LTD0 citations42
US10845703B2Nov 24, 2020
Film-forming composition containing silicone having crosslinking reactivity
NISSAN CHEMICAL IND LTD0 citations41
US10079146B2Sep 18, 2018
Resist underlayer film forming composition containing silicon containing cyclic organic group having hetero atom
NISSAN CHEMICAL IND LTD0 citations41
US9494862B2Nov 15, 2016
Resist underlayer film forming composition containing silicon having sulfone structure and amine structure
NISSAN CHEMICAL IND LTD0 citations41
NISSAN CHEMICAL CORP
6 patentsUS10865262B2Dec 15, 2020
Upper-layer film forming composition and method for producing a phase-separated pattern
NISSAN CHEMICAL CORP3 citations72
US10995172B2May 4, 2021
Self-organized film-forming composition for use in forming a micro-phase-separated pattern
NISSAN CHEMICAL CORP0 citations62
US12510823B2Dec 30, 2025
Resist underlayer film-forming composition containing alicyclic compound-terminated polymer
NISSAN CHEMICAL CORP0 citations58
US12072631B2Aug 27, 2024
Resist underlayer film-forming composition and method for forming resist pattern using the same
NISSAN CHEMICAL CORP1 citations58
US11440985B2Sep 13, 2022
Underlayer film-forming composition for use in forming a microphase-separated pattern
NISSAN CHEMICAL CORP0 citations51
US12030974B2Jul 9, 2024
Composition for forming block copolymer layer for formation of microphase-separated pattern
NISSAN CHEMICAL CORP0 citations48