Inventor
MCCULLOUGH KENNETH JOHN
US21 patents
Patents
21 patentsUS6346484B1Feb 12, 2002
Method for selective extraction of sacrificial place-holding material used in fabrication of air gap-containing interconnect structures
IBM80 citations97
US5976264ANov 2, 1999
Removal of fluorine or chlorine residue by liquid CO2
IBM142 citations96
US5908510AJun 1, 1999
Residue removal by supercritical fluids
IBM206 citations96
US6838015B2Jan 4, 2005
Liquid or supercritical carbon dioxide composition
IBM20 citations92
US6683008B1Jan 27, 2004
Process of removing ion-implanted photoresist from a workpiece
IBM19 citations92
US6622507B2Sep 23, 2003
Electromechanical device and a process of preparing same
IBM27 citations92
US6509136B1Jan 21, 2003
Process of drying a cast polymeric film disposed on a workpiece
IBM21 citations92
US6454869B1Sep 24, 2002
Process of cleaning semiconductor processing, handling and manufacturing equipment
IBM24 citations92
US6451375B1Sep 17, 2002
Process for depositing a film on a nanometer structure
IBM33 citations92
US6425956B1Jul 30, 2002
Process for removing chemical mechanical polishing residual slurry
IBM44 citations92
US6398875B1Jun 4, 2002
Process of drying semiconductor wafers using liquid or supercritical carbon dioxide
IBM53 citations92
US5780363AJul 14, 1998
Etching composition and use thereof
IBM43 citations85
US6834671B2Dec 28, 2004
Check valve for micro electro mechanical structure devices
IBM19 citations84
US6890855B2May 10, 2005
Process of removing residue material from a precision surface
IBM9 citations74
US6457480B1Oct 1, 2002
Process and apparatus for cleaning filters
IBM9 citations74
US6739346B2May 25, 2004
Apparatus for cleaning filters
IBM4 citations63
US6653233B2Nov 25, 2003
Process of providing a semiconductor device with electrical interconnection capability
IBM6 citations63
US6579464B2Jun 17, 2003
Fixtures for processing a workpiece in a supercritical fluid
IBM4 citations63
US7485964B2Feb 3, 2009
Dielectric material
IBM0 citations51
US7332436B2Feb 19, 2008
Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition
IBM0 citations51
US7056837B2Jun 6, 2006
Process of insulating a semiconductor device using a polymeric material
IBM1 citations51