Inventor

MOREAU WAYNE MARTIN

US45 patents

Patents

45 patents

US6685853B1Feb 3, 2004

Energy sensitive electrically conductive admixtures, uses thereof, methods of fabrication and structures fabricated therewith

IBM79 citations97

US6346484B1Feb 12, 2002

Method for selective extraction of sacrificial place-holding material used in fabrication of air gap-containing interconnect structures

IBM80 citations97

US6558475B1May 6, 2003

Process for cleaning a workpiece using supercritical carbon dioxide

IBM126 citations96

US5659203AAug 19, 1997

Reworkable polymer chip encapsulant

IBM71 citations94

US7361444B1Apr 22, 2008

Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof

IBM22 citations92

US6838015B2Jan 4, 2005

Process of cleaning semiconductor processing, handling and manufacturing equipment

IBM24 citations92

US6451375B1Sep 17, 2002

Process for depositing a film on a nanometer structure

IBM33 citations92

US6425956B1Jul 30, 2002

Process for removing chemical mechanical polishing residual slurry

IBM44 citations92

US6398875B1Jun 4, 2002

Process of drying semiconductor wafers using liquid or supercritical carbon dioxide

IBM53 citations92

US6221568B1Apr 24, 2001

Developers for polychloroacrylate and polychloromethacrylate based resists

IBM37 citations92

US6207787B1Mar 27, 2001

Antireflective coating for microlithography

IBM51 citations92

US6132644AOct 17, 2000

Energy sensitive electrically conductive admixtures

IBM28 citations92

US5955222ASep 21, 1999

Method of making a rim-type phase-shift mask and mask manufactured thereby

IBM51 citations92

US5731385AMar 24, 1998

Polymeric dyes for antireflective coatings

IBM21 citations91

US5654376AAug 5, 1997

Polymeric dyes for antireflective coatings

IBM21 citations91

US6543617B2Apr 8, 2003

Packaged radiation sensitive coated workpiece process for making and method of storing same

IBM16 citations90

US5930597AJul 27, 1999

Reworkable polymer chip encapsulant

IBM38 citations90

US5736301AApr 7, 1998

Method for patterning a photoresist material wherein an anti-reflective coating comprising a copolymer of bisphenol A and benzophenone is used

IBM20 citations89

US6834671B2Dec 28, 2004

Check valve for micro electro mechanical structure devices

IBM19 citations84

US6890855B2May 10, 2005

Process of removing residue material from a precision surface

IBM9 citations74

US6457480B1Oct 1, 2002

Process and apparatus for cleaning filters

IBM9 citations74

US7709177B2May 4, 2010

Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof

IBM7 citations73

US6051364AApr 18, 2000

Polymeric dyes for antireflective coatings

IBM5 citations72

US5800963ASep 1, 1998

Polymeric dyes for antireflective coatings

IBM7 citations72

US5795701AAug 18, 1998

Making of microlithographic structures with an underlayer film containing a thermolyzed azide compound

IBM12 citations72

US5783361AJul 21, 1998

Microlithographic structure with an underlayer film containing a thermolyzed azide compound

IBM10 citations72

US5663036ASep 2, 1997

Microlithographic structure with an underlayer film comprising a thermolyzed azide

IBM11 citations72

US6892741B2May 17, 2005

Apparatus and process for supercritical carbon dioxide phase processing

IBM5 citations71

US6051659AApr 18, 2000

Highly sensitive positive photoresist composition

IBM9 citations69

US6739346B2May 25, 2004

Apparatus for cleaning filters

IBM4 citations63

US6653233B2Nov 25, 2003

Process of providing a semiconductor device with electrical interconnection capability

IBM6 citations63

US6579464B2Jun 17, 2003

Fixtures for processing a workpiece in a supercritical fluid

IBM4 citations63

US7736833B2Jun 15, 2010

Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof

IBM3 citations62

US7638266B2Dec 29, 2009

Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer

IBM4 citations62

US7168224B2Jan 30, 2007

Method of making a packaged radiation sensitive resist film-coated workpiece

IBM4 citations60

US6953042B2Oct 11, 2005

Apparatus and process for supercritical carbon dioxide phase processing

IBM2 citations60

US6479018B2Nov 12, 2002

Detection of a gaseous substance emanating from a layer of polymeric composition

IBM2 citations54

US7485964B2Feb 3, 2009

Dielectric material

IBM0 citations51

US7332436B2Feb 19, 2008

Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition

IBM0 citations51

US7056837B2Jun 6, 2006

Process of insulating a semiconductor device using a polymeric material

IBM1 citations51

US6235452B1May 22, 2001

Detection of a gaseous substance emanating from a layer of polymeric composition

IBM1 citations44

US6153696ANov 28, 2000

Process for forming carbonates of hydroxyaromatic compounds

IBM0 citations35

MOREAU WAYNE MARTIN

Patents

Energy sensitive electrically conductive admixtures, uses thereof, methods of fabrication and structures fabricated therewith

Method for selective extraction of sacrificial place-holding material used in fabrication of air gap-containing interconnect structures

Process for cleaning a workpiece using supercritical carbon dioxide

Reworkable polymer chip encapsulant

Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof

Liquid or supercritical carbon dioxide composition

Process of removing ion-implanted photoresist from a workpiece

Electromechanical device and a process of preparing same

Process of cleaning semiconductor processing, handling and manufacturing equipment

Process for depositing a film on a nanometer structure

Process for removing chemical mechanical polishing residual slurry

Process of drying semiconductor wafers using liquid or supercritical carbon dioxide

Developers for polychloroacrylate and polychloromethacrylate based resists

Antireflective coating for microlithography

Energy sensitive electrically conductive admixtures

Method of making a rim-type phase-shift mask and mask manufactured thereby

Polymeric dyes for antireflective coatings

Polymeric dyes for antireflective coatings

Packaged radiation sensitive coated workpiece process for making and method of storing same

Reworkable polymer chip encapsulant

Method for patterning a photoresist material wherein an anti-reflective coating comprising a copolymer of bisphenol A and benzophenone is used

Check valve for micro electro mechanical structure devices

Process of removing residue material from a precision surface

Process and apparatus for cleaning filters

Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof

Polymeric dyes for antireflective coatings

Polymeric dyes for antireflective coatings

Making of microlithographic structures with an underlayer film containing a thermolyzed azide compound

Microlithographic structure with an underlayer film containing a thermolyzed azide compound

Microlithographic structure with an underlayer film comprising a thermolyzed azide

Apparatus and process for supercritical carbon dioxide phase processing

Highly sensitive positive photoresist composition

Apparatus for cleaning filters

Process of providing a semiconductor device with electrical interconnection capability

Fixtures for processing a workpiece in a supercritical fluid

Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof

Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer

Method of making a packaged radiation sensitive resist film-coated workpiece

Apparatus and process for supercritical carbon dioxide phase processing

Detection of a gaseous substance emanating from a layer of polymeric composition

Dielectric material

Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition

Process of insulating a semiconductor device using a polymeric material

Detection of a gaseous substance emanating from a layer of polymeric composition

Process for forming carbonates of hydroxyaromatic compounds