Inventor
ACHUTHAN KRISHNASHREE
US33 patents
⚠️ This page may combine multiple inventors who share the name “ACHUTHAN KRISHNASHREE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED MICRO DEVICES INC
26 patentsUS6291348B1Sep 18, 2001
Method of forming Cu-Ca-O thin films on Cu surfaces in a chemical solution and semiconductor device thereby formed
ADVANCED MICRO DEVICES INC256 citations99
US6855607B2Feb 15, 2005
Multi-step chemical mechanical polishing of a gate area in a FinFET
ADVANCED MICRO DEVICES INC70 citations98
US6756643B1Jun 29, 2004
Dual silicon layer for chemical mechanical polishing planarization
ADVANCED MICRO DEVICES INC31 citations93
US6559546B1May 6, 2003
Tin palladium activation with maximized nuclei density and uniformity on barrier material in interconnect structure
ADVANCED MICRO DEVICES INC16 citations93
US6498093B1Dec 24, 2002
Formation without vacuum break of sacrificial layer that dissolves in acidic activation solution within interconnect
ADVANCED MICRO DEVICES INC20 citations93
US7449413B1Nov 11, 2008
Method for effectively removing polysilicon nodule defects
ADVANCED MICRO DEVICES INC26 citations92
US6613646B1Sep 2, 2003
Methods for reduced trench isolation step height
ADVANCED MICRO DEVICES INC29 citations92
US6933219B1Aug 23, 2005
Tightly spaced gate formation through damascene process
ADVANCED MICRO DEVICES INC19 citations84
US6607925B1Aug 19, 2003
Hard mask removal process including isolation dielectric refill
ADVANCED MICRO DEVICES INC16 citations84
US7125776B2Oct 24, 2006
Multi-step chemical mechanical polishing of a gate area in a FinFET
ADVANCED MICRO DEVICES INC9 citations74
US6989563B1Jan 24, 2006
Flash memory cell with UV protective layer
ADVANCED MICRO DEVICES INC9 citations74
US6982464B2Jan 3, 2006
Dual silicon layer for chemical mechanical polishing planarization
ADVANCED MICRO DEVICES INC9 citations74
US6812076B1Nov 2, 2004
Dual silicon layer for chemical mechanical polishing planarization
ADVANCED MICRO DEVICES INC7 citations74
US6649511B1Nov 18, 2003
Method of manufacturing a seed layer with annealed region for integrated circuit interconnects
ADVANCED MICRO DEVICES INC7 citations74
US6569747B1May 27, 2003
Methods for trench isolation with reduced step height
ADVANCED MICRO DEVICES INC7 citations74
US6498397B1Dec 24, 2002
Seed layer with annealed region for integrated circuit interconnects
ADVANCED MICRO DEVICES INC8 citations74
US6472310B1Oct 29, 2002
Tin palladium activation with maximized nuclei density and uniformity on barrier material in interconnect structure
ADVANCED MICRO DEVICES INC8 citations74
US6423433B1Jul 23, 2002
Method of forming Cu-Ca-O thin films on Cu surfaces in a chemical solution and semiconductor device thereby
ADVANCED MICRO DEVICES INC7 citations74
US6413869B1Jul 2, 2002
Dielectric protected chemical-mechanical polishing in integrated circuit interconnects
ADVANCED MICRO DEVICES INC10 citations74
US6610577B1Aug 26, 2003
Self-aligned polysilicon polish
ADVANCED MICRO DEVICES INC11 citations73
US7077728B1Jul 18, 2006
Method for reducing edge array erosion in a high-density array
ADVANCED MICRO DEVICES INC4 citations63
US7052969B1May 30, 2006
Method for semiconductor wafer planarization by isolation material growth
ADVANCED MICRO DEVICES INC4 citations63
US6770523B1Aug 3, 2004
Method for semiconductor wafer planarization by CMP stop layer formation
ADVANCED MICRO DEVICES INC5 citations62
US6605517B1Aug 12, 2003
Method for minimizing nitride residue on a silicon wafer
ADVANCED MICRO DEVICES INC2 citations62
US6462409B1Oct 8, 2002
Semiconductor wafer polishing apparatus
ADVANCED MICRO DEVICES INC0 citations52
US6426297B1Jul 30, 2002
Differential pressure chemical-mechanical polishing in integrated circuit interconnects
ADVANCED MICRO DEVICES INC0 citations52
SPANSION LLC
3 patentsUS7307002B2Dec 11, 2007
Non-critical complementary masking method for poly-1 definition in flash memory device fabrication
SPANSION LLC4 citations59
US7358191B1Apr 15, 2008
Method for decreasing sheet resistivity variations of an interconnect metal layer
SPANSION LLC0 citations50
US7294573B1Nov 13, 2007
Method for controlling poly 1 thickness and uniformity in a memory array fabrication process
SPANSION LLC0 citations47