Inventor
BOWERING NORBERT
US17 patents
⚠️ This page may combine multiple inventors who share the name “BOWERING NORBERT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CYMER INC
14 patentsUS7671349B2Mar 2, 2010
Laser produced plasma EUV light source
CYMER INC54 citations97
US7217940B2May 15, 2007
Collector for EUV light source
CYMER INC60 citations97
US7164144B2Jan 16, 2007
EUV light source
CYMER INC113 citations97
US6972421B2Dec 6, 2005
Extreme ultraviolet light source
CYMER INC141 citations97
US6815700B2Nov 9, 2004
Plasma focus light source with improved pulse power system
CYMER INC113 citations97
US7598509B2Oct 6, 2009
Laser produced plasma EUV light source
CYMER INC41 citations92
US7525111B2Apr 28, 2009
High repetition rate laser produced plasma EUV light source
CYMER INC13 citations92
US7365351B2Apr 29, 2008
Systems for protecting internal components of a EUV light source from plasma-generated debris
CYMER INC14 citations91
US8035092B2Oct 11, 2011
Laser produced plasma EUV light source
CYMER INC7 citations84
US7323703B2Jan 29, 2008
EUV light source
CYMER INC10 citations84
US7309871B2Dec 18, 2007
Collector for EUV light source
CYMER INC10 citations84
US7732793B2Jun 8, 2010
Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
CYMER INC14 citations82
US7288778B2Oct 30, 2007
Collector for EUV light source
CYMER INC10 citations81
US7291853B2Nov 6, 2007
Discharge produced plasma EUV light source
CYMER INC9 citations73
ASML NETHERLANDS BV
3 patentsUS9392678B2Jul 12, 2016
Target material supply apparatus for an extreme ultraviolet light source
ASML NETHERLANDS BV5 citations83
US9632418B2Apr 25, 2017
Target material supply apparatus for an extreme ultraviolet light source
ASML NETHERLANDS BV2 citations72
US11215736B2Jan 4, 2022
EUV optical element having blister-resistant multilayer cap
ASML NETHERLANDS BV0 citations62