Inventor
LEE HENG-JEN
TW31 patents
⚠️ This page may combine multiple inventors who share the name “LEE HENG-JEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
10 patentsUS10558120B2Feb 11, 2020
System and method for supplying and dispensing bubble-free photolithography chemical solutions
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US9196515B2Nov 24, 2015
Litho cluster and modulization to enhance productivity
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations63
US12025917B2Jul 2, 2024
System and method for supplying and dispensing bubble-free photolithography chemical solutions
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12196491B2Jan 14, 2025
Adaptive baking method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11204200B2Dec 21, 2021
Adaptive baking method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US9601324B2Mar 21, 2017
Method of making wafer assembly
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10006717B2Jun 26, 2018
Adaptive baking system and method of using the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
US9817315B2Nov 14, 2017
System and method for supplying and dispensing bubble-free photolithography chemical solutions
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
US10274839B2Apr 30, 2019
Two-dimensional marks
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49
US9690212B2Jun 27, 2017
Hybrid focus-exposure matrix
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations41
HUANG I-HSIUNG
4 patentsUS9111982B2Aug 18, 2015
Wafer assembly with carrier wafer
HUANG I-HSIUNG0 citations50
US8903532B2Dec 2, 2014
Litho cluster and modulization to enhance productivity
HUANG I-HSIUNG0 citations50
US8101530B2Jan 24, 2012
Lithography patterning method
HUANG I-HSIUNG1 citations50
US8609545B2Dec 17, 2013
Method to improve mask critical dimension uniformity (CDU)
HUANG I-HSIUNG0 citations35