P

Inventor

WELLS DAVID ADAM

US14 patents
⚠️ This page may combine multiple inventors who share the name “WELLS DAVID ADAM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LEFEVRE PAUL

6 patents
US8172648B2May 8, 2012

Chemical-mechanical planarization pad

LEFEVRE PAUL13 citations82
US8684794B2Apr 1, 2014

Chemical mechanical planarization pad with void network

LEFEVRE PAUL15 citations81
US8758659B2Jun 24, 2014

Method of grooving a chemical-mechanical planarization pad

LEFEVRE PAUL2 citations60
US8491360B2Jul 23, 2013

Three-dimensional network in CMP pad

LEFEVRE PAUL2 citations60
US8790165B2Jul 29, 2014

Multi-layered chemical-mechanical planarization pad

LEFEVRE PAUL0 citations49
US8435099B2May 7, 2013

Chemical-mechanical planarization pad including patterned structural domains

LEFEVRE PAUL1 citations49

INNOPAD INC

3 patents
US9162341B2Oct 20, 2015

Chemical-mechanical planarization pad including patterned structural domains

INNOPAD INC15 citations90
US7985121B2Jul 26, 2011

Chemical-mechanical planarization pad having end point detection window

INNOPAD INC2 citations60
US8377351B2Feb 19, 2013

Polishing pad with controlled void formation

INNOPAD INC1 citations49

HSU OSCAR K

3 patents
US8900036B2Dec 2, 2014

Polishing pad having micro-grooves on the pad surface

HSU OSCAR K2 citations60
US8430721B2Apr 30, 2013

Chemical-mechanical planarization pad

HSU OSCAR K3 citations60
US8137166B2Mar 20, 2012

Polishing pad having micro-grooves on the pad surface

HSU OSCAR K3 citations60

FNS TECH CO LTD

2 patents
US9375822B2Jun 28, 2016

Polishing pad having micro-grooves on the pad surface

FNS TECH CO LTD12 citations81
US9796063B2Oct 24, 2017

Multi-layered chemical-mechanical planarization pad

FNS TECH CO LTD0 citations48