Inventor

PAZIDIS ALEXANDRA

DE20 patents

⚠️ This page may combine multiple inventors who share the name “PAZIDIS ALEXANDRA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

PAZIDIS ALEXANDRA

ZEISS CARL SMT AG

Projection objective for immersion lithography

Optical element, projection lens and associated projection exposure apparatus

Microlithographic exposure apparatus

Objective with crystal lenses

Microlithographic projection exposure apparatus

Method and device for decontaminating optical surfaces

ZEISS CARL SMT GMBH

Method for forming nanostructures on a surface and optical element

Mirror assembly and optical assembly comprising same

Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element

Reflective optical element

Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus

PAZIDIS ALEXANDRA

Projection system with compensation of intensity variations and compensation element therefor

Optical element for reflection of UV radiation, method for manufacturing the same and projection exposure apparatus comprising the same

Method of processing an optical element and an optical element, in particular for a microlithographic projection exposure apparatus

Off-axis objectives with rotatable optical element

ZEISS CARL LASER OPTICS GMBH

Mirror with dielectric coating

WEISSENRIEDER KARL-STEFAN

Micromirror arrangement having a coating and method for the production thereof

FIOLKA DAMIAN

Microlithographic projection exposure apparatus

ZACZEK CHRISTOPH

Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element

KAMENOV VLADIMIR

Microlithographic projection exposure apparatus