P

Inventor

GOTO AKIYOSHI

JP45 patents
⚠️ This page may combine multiple inventors who share the name “GOTO AKIYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FUJIFILM CORP

41 patents
US8025833B2Sep 27, 2011

Curable composition for nanoimprint, and patterning method

FUJIFILM CORP21 citations92
US9250519B2Feb 2, 2016

Pattern forming method and actinic ray-sensitive or radiation-sensitive resin composition for use in the method

FUJIFILM CORP8 citations83
US10261417B2Apr 16, 2019

Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film and pattern forming method, each using composition, and method for manufacturing electronic device

FUJIFILM CORP3 citations73
US9551931B2Jan 24, 2017

Method of forming pattern, actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, process for manufacturing electronic device and electronic device

FUJIFILM CORP5 citations73
US11281103B2Mar 22, 2022

Composition for forming upper layer film, pattern forming method, resist pattern, and method for manufacturing electronic device

FUJIFILM CORP2 citations72
US10859914B2Dec 8, 2020

Pattern forming method, method for producing electronic device, and actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development

FUJIFILM CORP3 citations72
US10802399B2Oct 13, 2020

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

FUJIFILM CORP5 citations72
US10018913B2Jul 10, 2018

Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device

FUJIFILM CORP2 citations72
US9996003B2Jun 12, 2018

Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device

FUJIFILM CORP4 citations72
US11067890B2Jul 20, 2021

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

FUJIFILM CORP2 citations71
US10025186B2Jul 17, 2018

Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device

FUJIFILM CORP2 citations71
US12038689B2Jul 16, 2024

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

FUJIFILM CORP1 citations62
US12032288B2Jul 9, 2024

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

FUJIFILM CORP1 citations62
US12001140B2Jun 4, 2024

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

FUJIFILM CORP0 citations62
US11150557B2Oct 19, 2021

Pattern forming method, method for manufacturing electronic device, monomer for producing resin for semiconductor device manufacturing process, resin, method for producing resin, actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film

FUJIFILM CORP0 citations62
US10175578B2Jan 8, 2019

Pattern forming method, composition for forming protective film, method for manufacturing electronic device, and electronic device

FUJIFILM CORP1 citations62
US9405197B2Aug 2, 2016

Pattern forming method, method for manufacturing electronic device, and electronic device

FUJIFILM CORP2 citations62
US10303058B2May 28, 2019

Pattern forming method, treating agent, electronic device, and method for manufacturing the same

FUJIFILM CORP1 citations61
US12044967B2Jul 23, 2024

Actinic-ray-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, and method for manufacturing electronic device

FUJIFILM CORP2 citations58
US12007688B2Jun 11, 2024

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and resin

FUJIFILM CORP0 citations58
US11579528B2Feb 14, 2023

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

FUJIFILM CORP0 citations57
US11886113B2Jan 30, 2024

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

FUJIFILM CORP0 citations52
US10578968B2Mar 3, 2020

Pattern forming method, resist pattern, and process for producing electronic device

FUJIFILM CORP0 citations52
US10114292B2Oct 30, 2018

Pattern forming method, resist pattern, and method for manufacturing electronic device

FUJIFILM CORP0 citations52
US9841679B2Dec 12, 2017

Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device

FUJIFILM CORP0 citations52
US12422752B2Sep 23, 2025

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

FUJIFILM CORP0 citations51
US12164228B2Dec 10, 2024

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and resin

FUJIFILM CORP0 citations51
US11249395B2Feb 15, 2022

Pattern forming method, method for manufacturing electronic device, laminate film, and composition for forming upper layer film

FUJIFILM CORP0 citations51
US9791777B2Oct 17, 2017

Active light sensitive or radiation sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device

FUJIFILM CORP0 citations51
US9116426B2Aug 25, 2015

Dye compound, method of producing dipyrromethene metal complex compound, method of producing dye multimer, substituted pyrrole compound, colored curable composition, color filter, method of producing color filter, solid-state image sensor and liquid crystal display device

FUJIFILM CORP1 citations51
US12585187B2Mar 24, 2026

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and compound

FUJIFILM CORP0 citations50
US12554196B2Feb 17, 2026

Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, method for manufacturing electronic device, compound, and method for producing compound

FUJIFILM CORP0 citations50
US12216404B2Feb 4, 2025

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

FUJIFILM CORP0 citations50
US12032290B2Jul 9, 2024

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

FUJIFILM CORP0 citations50
US11584810B2Feb 21, 2023

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method of manufacturing electronic device, compound, and resin

FUJIFILM CORP0 citations50
US11156917B2Oct 26, 2021

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

FUJIFILM CORP0 citations50
US12481215B2Nov 25, 2025

Active-light-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, method for manufacturing electronic device, compound, and resin

FUJIFILM CORP0 citations49
US11073762B2Jul 27, 2021

Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generator

FUJIFILM CORP0 citations48
US10852637B2Dec 1, 2020

Pattern forming method, resist pattern, method for manufacturing electronic device, and composition for forming upper layer film

FUJIFILM CORP0 citations41
US10234759B2Mar 19, 2019

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern

FUJIFILM CORP0 citations41
US9952509B2Apr 24, 2018

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, method for manufacturing electronic device, and electronic device

FUJIFILM CORP0 citations40

ITO JUNICHI

2 patents

WADA KENJI

1 patent

GOTO AKIYOSHI

1 patent