Inventor

WEGMANN ULRICH

DE44 patents

⚠️ This page may combine multiple inventors who share the name “WEGMANN ULRICH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WEGMANN ULRICH

ZEISS CARL SMT AG

System for measuring the image quality of an optical imaging system

Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry

Apparatus and method for measuring the wavefront of an optical system

Apparatus for wavefront detection

Method of producing an optical imaging system

Method of optimizing imaging performance

Interferometric measuring device and projection exposure installation comprising such measuring device

Apparatus and method for measuring an optical imaging system, and detector unit

Method and system for measuring the imaging quality of an optical imaging system

Method and apparatus for determining the influencing of the state of polarization by an optical system; and an analyser

System for measuring the image quality of an optical imaging system

Optical measuring apparatus and operating method for imaging error correction in an optical imaging system

Method and apparatus for setting optical imaging properties by means of radiation treatment

Apparatus for polarization-specific examination, optical imaging system, and calibration method

Device and method for the optical measurement of an optical system by using an immersion fluid

Device and method for the determination of imaging errors and microlithography projection exposure system

Moire method and measuring system for measuring the distortion of an optical imaging system

Method of manufacturing a miniaturized device

Method of optimizing imaging performance

Method and apparatus for determining telecentricity and microlithography projection exposure apparatus

Method and system for measuring the imaging quality of an optical imaging system

Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatus

Method of determining optical properties and projection exposure system comprising a wavefront detection system

ZEISS CARL SMT GMBH

Device and method for the optical measurement of an optical system, measurement structure support, and microlithographic projection exposure apparatus

Measuring method and measuring system for interferometrically measuring the imaging quality

Measuring method and measuring arrangement for an imaging optical system

Device and method for wavefront analysis

Exposure apparatus and measuring device for a projection lens

Method for measuring an optical system

Optical imaging device with image defect determination

Optical imaging device with image defect determination

Microlithographic projection exposure apparatus and measuring device for a projection lens

Device and method for the optical measurement of an optical system by using an immersion fluid

System for measuring the image quality of an optical imaging system

System for measuring the image quality of an optical imaging system

WEGMANN ULRICH

Optical scattering disk, use thereof, and wavefront measuring apparatus

Device and method for the optical measurement of an optical system by using an immersion fluid

Optical scattering disk, use thereof, and wavefront measuring apparatus

SCHRIEVER MARTIN

Optical apparatus and method for modifying the imaging behavior of such apparatus

FREIMANN ROLF

Optical imaging device with image defect determination

ZEISS CARL SMS GMBH

Device and method for the interferometric measurement of phase masks

MENGEL MARKUS

System for measuring the image quality of an optical imaging system

EMER WOLFGANG

Methods and apparatus for measuring wavefronts and for determining scattered light, and related devices and manufacturing methods

EHRMANN ALBRECHT

Exposure apparatus and measuring device for a projection lens