Inventor

SHIN HWA-SOOK

KR17 patents

⚠️ This page may combine multiple inventors who share the name “SHIN HWA-SOOK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHIN HWA-SOOK

SAMSUNG ELECTRONICS CO LTD

Semiconductor device having dual isolation structure and method of fabricating the same

Double diffused MOS transistor and method for manufacturing same

Semiconductor devices with multiple isolation structure and methods for fabricating the same

Method for manufacturing semiconductor memory device

Semiconductor device having dual isolation structure and method of fabricating the same

Methods of forming silicide layers on source/drain regions of MOS transistors

Methods for forming patterned platinum layers using masking layers including titanium and related structures

Methods for patterning microelectronic structures using chlorine, oxygen, and fluorine

Double diffused MOS transistor and method for manufacturing same

Method of fabricating semiconductor device having storage capacitor and higher voltage resistance capacitor and semiconductor device fabricated using the same

Methods of forming electrically conductive lines using nitrogen and chlorine containing gas mixtures

Methods for patterning microelectronic structures using chlorine and oxygen

High voltage transistor and methods of manufacturing the same

CHANG DONG-RYUL

Capacitor device and method of fabricating the same

Semiconductor device

Programmable circuit including differential amplifier circuit

SHIN HWA-SOOK

Method of fabricating semiconductor device having storage capacitor and higher voltage resistance capacitor and semiconductor device fabricated using the same