P

Inventor

MORIYA ATSUSHI

JP35 patents
⚠️ This page may combine multiple inventors who share the name “MORIYA ATSUSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI INT ELECTRIC INC

18 patents
US6503079B2Jan 7, 2003

Substrate processing apparatus and method for manufacturing semiconductor device

HITACHI INT ELECTRIC INC478 citations96
US9412587B2Aug 9, 2016

Method of manufacturing semiconductor device, substrate processing apparatus, gas supply system, and recording medium

HITACHI INT ELECTRIC INC4 citations83
US6872636B2Mar 29, 2005

Method for fabricating a semiconductor device

HITACHI INT ELECTRIC INC13 citations83
US9691609B2Jun 27, 2017

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

HITACHI INT ELECTRIC INC2 citations72
US10529560B2Jan 7, 2020

Method of manufacturing semiconductor device, substrate processing apparatus and recording medium

HITACHI INT ELECTRIC INC3 citations69
US6949474B2Sep 27, 2005

Method of manufacturing a semiconductor device and a semiconductor manufacture system

HITACHI INT ELECTRIC INC3 citations62
US9941119B2Apr 10, 2018

Method of forming silicon layer in manufacturing semiconductor device and recording medium

HITACHI INT ELECTRIC INC1 citations61
US10163910B2Dec 25, 2018

Method of manufacturing semiconductor device

HITACHI INT ELECTRIC INC0 citations52
US8012885B2Sep 6, 2011

Manufacturing method of semiconductor device

HITACHI INT ELECTRIC INC1 citations52
US10262857B2Apr 16, 2019

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

HITACHI INT ELECTRIC INC0 citations51
US10090152B2Oct 2, 2018

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

HITACHI INT ELECTRIC INC1 citations51
US9997354B2Jun 12, 2018

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

HITACHI INT ELECTRIC INC1 citations51
US9540728B2Jan 10, 2017

Substrate processing apparatus, apparatus for manufacturing semiconductor device, and gas supply system

HITACHI INT ELECTRIC INC0 citations51
US7851379B2Dec 14, 2010

Substrate processing method and substrate processing apparatus

HITACHI INT ELECTRIC INC0 citations51
US8025739B2Sep 27, 2011

Method of manufacturing semiconductor device

HITACHI INT ELECTRIC INC1 citations50
US10262872B2Apr 16, 2019

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

HITACHI INT ELECTRIC INC0 citations48
US10090322B2Oct 2, 2018

Method of manufacturing semiconductor device

HITACHI INT ELECTRIC INC0 citations42
US10134584B2Nov 20, 2018

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

HITACHI INT ELECTRIC INC0 citations41

KOKUSAI ELECTRIC CORP

5 patents

NEC CORP

3 patents

KAWATA MASANOBU

2 patents

MORIYA ATSUSHI

2 patents

TOYO ENGINEERING CORP

1 patent

OZAKI TAKASHI

1 patent

INOKUCHI YASUHIRO

1 patent

TDK CORP

1 patent

ISHIBASHI KIYOHISA

1 patent