Inventor
SWEENEY JOSEPH D
US52 patents
⚠️ This page may combine multiple inventors who share the name “SWEENEY JOSEPH D”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ENTEGRIS INC
28 patentsUS10247363B2Apr 2, 2019
Smart package
ENTEGRIS INC7 citations82
US9897257B2Feb 20, 2018
Anti-spike pressure management of pressure-regulated fluid storage and delivery vessels
ENTEGRIS INC16 citations81
US10109488B2Oct 23, 2018
Phosphorus or arsenic ion implantation utilizing enhanced source techniques
ENTEGRIS INC3 citations73
US9831063B2Nov 28, 2017
Ion implantation compositions, systems, and methods
ENTEGRIS INC3 citations73
US11139145B2Oct 5, 2021
Ion implantation system with mixture of arc chamber materials
ENTEGRIS INC2 citations72
US9754786B2Sep 5, 2017
Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system
ENTEGRIS INC2 citations72
US11333302B2May 17, 2022
Adsorbent-based, mechanically-regulated gas storage and delivery vessel
ENTEGRIS INC2 citations71
US9960042B2May 1, 2018
Carbon dopant gas and co-flow for implant beam and source life performance improvement
ENTEGRIS INC4 citations71
US9171725B2Oct 27, 2015
Enriched silicon precursor compositions and apparatus and processes for utilizing same
ENTEGRIS INC4 citations71
US10845006B2Nov 24, 2020
Smart package
ENTEGRIS INC2 citations70
US12347639B2Jul 1, 2025
Method and systems useful for producing aluminum ions
ENTEGRIS INC0 citations62
US11827973B2Nov 28, 2023
Germanium tetraflouride and hydrogen mixtures for an ion implantation system
ENTEGRIS INC0 citations62
US11682540B2Jun 20, 2023
Ion implantation system with mixture of arc chamber materials
ENTEGRIS INC0 citations62
US11538687B2Dec 27, 2022
Fluorine ion implantation system with non-tungsten materials and methods of using
ENTEGRIS INC0 citations62
US11062906B2Jul 13, 2021
Silicon implantation in substrates and provision of silicon precursor compositions therefor
ENTEGRIS INC0 citations62
US10892137B2Jan 12, 2021
Ion implantation processes and apparatus using gallium
ENTEGRIS INC0 citations62
US10622192B2Apr 14, 2020
Methods and assemblies using fluorine containing and inert gases for plasma flood gun operation
ENTEGRIS INC1 citations62
US9142387B2Sep 22, 2015
Isotopically-enriched boron-containing compounds, and methods of making and using same
ENTEGRIS INC3 citations62
US9012874B2Apr 21, 2015
Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system
ENTEGRIS INC3 citations62
US11881376B2Jan 23, 2024
Method and systems useful for producing aluminum ions
ENTEGRIS INC0 citations59
US10497569B2Dec 3, 2019
Carbon materials for carbon implantation
ENTEGRIS INC0 citations52
US10497532B2Dec 3, 2019
Ion implantation processes and apparatus
ENTEGRIS INC0 citations52
US9685304B2Jun 20, 2017
Isotopically-enriched boron-containing compounds, and methods of making and using same
ENTEGRIS INC0 citations52
US9631778B2Apr 25, 2017
Endpoint determination for capillary-assisted flow control
ENTEGRIS INC0 citations51
US9132412B2Sep 15, 2015
Component for solar adsorption refrigeration system and method of making such component
ENTEGRIS INC0 citations51
US10354877B2Jul 16, 2019
Carbon dopant gas and co-flow for implant beam and source life performance improvement
ENTEGRIS INC0 citations50
US9764298B2Sep 19, 2017
Apparatus and method for preparation of compounds or intermediates thereof from a solid material, and using such compounds and intermediates
ENTEGRIS INC0 citations50
US10508773B2Dec 17, 2019
Smart package
ENTEGRIS INC0 citations49
ADVANCED TECH MATERIALS
9 patentsUS7105037B2Sep 12, 2006
Semiconductor manufacturing facility utilizing exhaust recirculation
ADVANCED TECH MATERIALS39 citations96
US7485169B2Feb 3, 2009
Semiconductor manufacturing facility utilizing exhaust recirculation
ADVANCED TECH MATERIALS19 citations92
US6805728B2Oct 19, 2004
Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream
ADVANCED TECH MATERIALS47 citations92
US6759018B1Jul 6, 2004
Method for point-of-use treatment of effluent gas streams
ADVANCED TECH MATERIALS62 citations91
US9111860B2Aug 18, 2015
Ion implantation system and method
ADVANCED TECH MATERIALS6 citations84
US8785889B2Jul 22, 2014
Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system
ADVANCED TECH MATERIALS5 citations83
US8779383B2Jul 15, 2014
Enriched silicon precursor compositions and apparatus and processes for utilizing same
ADVANCED TECH MATERIALS13 citations82
US7857880B2Dec 28, 2010
Semiconductor manufacturing facility utilizing exhaust recirculation
ADVANCED TECH MATERIALS7 citations74
US9666435B2May 30, 2017
Apparatus and process for integrated gas blending
ADVANCED TECH MATERIALS4 citations69
KAIM ROBERT
5 patentsUS8598022B2Dec 3, 2013
Isotopically-enriched boron-containing compounds, and methods of making and using same
KAIM ROBERT12 citations92
US8062965B2Nov 22, 2011
Isotopically-enriched boron-containing compounds, and methods of making and using same
KAIM ROBERT21 citations92
US8399865B2Mar 19, 2013
Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system
KAIM ROBERT11 citations91
US8237134B2Aug 7, 2012
Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system
KAIM ROBERT23 citations91
US8138071B2Mar 20, 2012
Isotopically-enriched boron-containing compounds, and methods of making and using same
KAIM ROBERT3 citations62
SWEENEY JOSEPH D
2 patentsATMI ECOSYS CORP
1 patentBYL OLEG
1 patentJONES EDWARD E
1 patentDIMEO FRANK
1 patentAPPLIED MATERIALS INC
1 patentCARRUTHERS J DONALD
1 patentShowing the top 50 of 52 patents by PatentIndex Score.