Inventor
NISHIMURA TAKAHITO
JP16 patents
⚠️ This page may combine multiple inventors who share the name “NISHIMURA TAKAHITO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA MEMORY CORP
7 patentsUS10192741B2Jan 29, 2019
Device substrate, method of manufacturing device substrate, and method of manufacturing semiconductor device
TOSHIBA MEMORY CORP3 citations72
US9793120B2Oct 17, 2017
Device substrate, method of manufacturing device substrate, and method of manufacturing semiconductor device
TOSHIBA MEMORY CORP2 citations72
US11037948B2Jun 15, 2021
Semiconductor storage device and method for manufacturing semiconductor storage device
TOSHIBA MEMORY CORP6 citations67
US10868029B2Dec 15, 2020
Staggered semiconductor memory device
TOSHIBA MEMORY CORP1 citations62
US10915018B2Feb 9, 2021
Imprinting system, method of manufacturing semiconductor device, and recording medium
TOSHIBA MEMORY CORP0 citations47
US10879137B2Dec 29, 2020
Template, template component, and semiconductor device manufacturing method
TOSHIBA MEMORY CORP0 citations45
US10331028B2Jun 25, 2019
Imprinting apparatus, recording medium, and imprinting method
TOSHIBA MEMORY CORP0 citations41
KIOXIA CORP
5 patentsUS11264387B2Mar 1, 2022
Semiconductor storage device comprising staircase portion and method for manufacturing the same
KIOXIA CORP5 citations69
US12041794B2Jul 16, 2024
Semiconductor storage device comprising staircase portion
KIOXIA CORP0 citations59
US11631693B2Apr 18, 2023
Semiconductor memory device
KIOXIA CORP0 citations49
US12382634B2Aug 5, 2025
Semiconductor memory device that includes a plurality of first pillars, second pillars, and third pillars
KIOXIA CORP0 citations47
US12232319B2Feb 18, 2025
Semiconductor memory device
KIOXIA CORP0 citations47
HOYA CORP
3 patentsUS9778209B2Oct 3, 2017
Substrate for mask blanks, mask blank, transfer mask, and method of manufacturing them
HOYA CORP2 citations71
US10481488B2Nov 19, 2019
Mask blank substrate processing device, mask blank substrate processing method, mask blank substrate fabrication method, mask blank fabrication method, and transfer mask fabrication method
HOYA CORP0 citations39
US10310373B2Jun 4, 2019
Method for manufacturing mask blank substrate, method for manufacturing mask blank and method for manufacturing transfer mask
HOYA CORP0 citations39