Inventor
FAURE THOMAS B
US20 patents
⚠️ This page may combine multiple inventors who share the name “FAURE THOMAS B”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
19 patentsUS5160987ANov 3, 1992
Three-dimensional semiconductor structures formed from planar layers
IBM197 citations94
US6162565ADec 19, 2000
Dilute acid rinse after develop for chrome etch
IBM22 citations90
US5459001AOct 17, 1995
Low stress electrodeposition of gold for x-ray mask fabrication
IBM18 citations80
US5538151AJul 23, 1996
Recovery of an anodically bonded glass device from a susstrate by use of a metal interlayer
IBM6 citations73
US5124561AJun 23, 1992
Process for X-ray mask warpage reduction
IBM18 citations73
US5318687AJun 7, 1994
Low stress electrodeposition of gold for X-ray mask fabrication
IBM13 citations72
US7014959B2Mar 21, 2006
CD uniformity of chrome etch to photomask process
IBM8 citations71
US5319240AJun 7, 1994
Three dimensional integrated device and circuit structures
IBM13 citations71
US7861208B2Dec 28, 2010
Structure for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks
IBM2 citations62
US7709300B2May 4, 2010
Structure and method for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks
IBM3 citations62
US11143953B2Oct 12, 2021
Protection of photomasks from 193nm radiation damage using thin coatings of ALD Al2O3
IBM0 citations61
US6758912B2Jul 6, 2004
Method of inhibiting contaminants using dilute acid rinse
IBM3 citations60
US6494966B2Dec 17, 2002
Method of minimizing contaminating deposits using dilute acid rinse
IBM2 citations60
US5409852AApr 25, 1995
Method of Manufacturing three dimensional integrated device and circuit structures
IBM2 citations60
US7754394B2Jul 13, 2010
Method to etch chrome for photomask fabrication
IBM2 citations59
US6270949B1Aug 7, 2001
Single component developer for copolymer resists
IBM4 citations59
US6287434B1Sep 11, 2001
Plating cell apparatus for x-ray mask fabrication
IBM3 citations57
US6039858AMar 21, 2000
Plating process for x-ray mask fabrication
IBM4 citations57
US6426177B2Jul 30, 2002
Single component developer for use with ghost exposure
IBM0 citations45