Inventor
ABARRA EINSTEIN NOEL
JP34 patents
⚠️ This page may combine multiple inventors who share the name “ABARRA EINSTEIN NOEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
15 patentsUS12400963B2Aug 26, 2025
Conductive superlattice structures and methods of forming the same
TOKYO ELECTRON LTD0 citations62
US12170217B2Dec 17, 2024
Substrate processing apparatus and abnormality detection method
TOKYO ELECTRON LTD1 citations62
US11220741B2Jan 11, 2022
Film forming apparatus and film forming method
TOKYO ELECTRON LTD1 citations62
US12437976B2Oct 7, 2025
Substrate processing apparatus
TOKYO ELECTRON LTD0 citations61
US11742190B2Aug 29, 2023
Sputtering apparatus and film forming method
TOKYO ELECTRON LTD0 citations60
US11715671B2Aug 1, 2023
Film forming system, magnetization characteristic measuring device, and film forming method
TOKYO ELECTRON LTD0 citations60
US11939665B2Mar 26, 2024
Film thickness measuring apparatus and film thickness measuring method, and film forming system and film forming method
TOKYO ELECTRON LTD1 citations59
US12235045B2Feb 25, 2025
Magnetic annealing equipment and method
TOKYO ELECTRON LTD0 citations57
US11823880B2Nov 21, 2023
Target structure and film forming apparatus
TOKYO ELECTRON LTD0 citations52
US12469723B2Nov 11, 2025
Substrate processing apparatus and abnormality detection method
TOKYO ELECTRON LTD0 citations51
US12002667B2Jun 4, 2024
Sputtering apparatus and method of controlling sputtering apparatus
TOKYO ELECTRON LTD0 citations51
US11495446B2Nov 8, 2022
Film formation device and film formation method
TOKYO ELECTRON LTD0 citations51
US12553845B2Feb 17, 2026
Holder temperature detection method, holder monitoring method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations50
US11851750B2Dec 26, 2023
Apparatus and method for performing sputtering process
TOKYO ELECTRON LTD0 citations50
US11581171B2Feb 14, 2023
Cathode unit and film forming apparatus
TOKYO ELECTRON LTD0 citations50
CANON ANELVA CORP
9 patentsUS8016537B2Sep 13, 2011
Inline-type wafer conveyance device
CANON ANELVA CORP12 citations83
US8378576B2Feb 19, 2013
Ion beam generator
CANON ANELVA CORP12 citations81
US8053747B2Nov 8, 2011
Substrate processing apparatus and cleaning method of the same
CANON ANELVA CORP3 citations62
US7955480B2Jun 7, 2011
Sputtering apparatus and film deposition method
CANON ANELVA CORP4 citations62
US9911526B2Mar 6, 2018
Magnet unit and magnetron sputtering apparatus
CANON ANELVA CORP0 citations51
US8043483B2Oct 25, 2011
Film forming method by sputtering and sputtering apparatus thereof
CANON ANELVA CORP1 citations51
US10062545B2Aug 28, 2018
Apparatus and method for processing substrate using ion beam
CANON ANELVA CORP0 citations48
US8048277B2Nov 1, 2011
Magnet unit and magnetron sputtering apparatus
CANON ANELVA CORP0 citations41
US9422623B2Aug 23, 2016
Ion beam generator and ion beam plasma processing apparatus
CANON ANELVA CORP0 citations38
ENDO TETSUYA
4 patentsUS9058962B2Jun 16, 2015
Magnet unit and magnetron sputtering apparatus
ENDO TETSUYA9 citations82
US8776542B2Jul 15, 2014
Cooling system
ENDO TETSUYA6 citations71
US8673124B2Mar 18, 2014
Magnet unit and magnetron sputtering apparatus
ENDO TETSUYA3 citations61
US8778150B2Jul 15, 2014
Magnetron sputtering cathode, magnetron sputtering apparatus, and method of manufacturing magnetic device
ENDO TETSUYA0 citations40