Inventor
BAE JIN HEE
KR25 patents
⚠️ This page may combine multiple inventors who share the name “BAE JIN HEE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG SDI CO LTD
13 patentsUS11201052B2Dec 14, 2021
Composition for forming silica layer, silica layer and electronic device incorporating silica layer
SAMSUNG SDI CO LTD0 citations53
US10427944B2Oct 1, 2019
Composition for forming a silica based layer, silica based layer, and electronic device
SAMSUNG SDI CO LTD0 citations49
US10093830B2Oct 9, 2018
Composition for forming a silica based layer, method for manufacturing silica based layer, and electronic device including the silica based layer
SAMSUNG SDI CO LTD1 citations49
US9902873B2Feb 27, 2018
Composition for forming silica based layer, and method for manufacturing silica based layer
SAMSUNG SDI CO LTD0 citations49
US10106687B2Oct 23, 2018
Composition for forming silica layer, method for manufacturing silica layer and silica layer
SAMSUNG SDI CO LTD1 citations47
US10020185B2Jul 10, 2018
Composition for forming silica layer, silica layer, and electronic device
SAMSUNG SDI CO LTD0 citations47
US9721785B2Aug 1, 2017
Method for manufacturing silica layer, silica layer, and electronic device
SAMSUNG SDI CO LTD0 citations46
US10017646B2Jul 10, 2018
Composition for forming silica layer, method for manufacturing silica layer, and electric device including silica layer
SAMSUNG SDI CO LTD0 citations45
US12264075B2Apr 1, 2025
Composition for forming silica layer and silica layer
SAMSUNG SDI CO LTD0 citations44
US11518909B2Dec 6, 2022
Composition for forming silica layer, manufacturing method for silica layer, and silica layer
SAMSUNG SDI CO LTD0 citations44
US9957418B2May 1, 2018
Composition for forming silica layer, method for manufacturing silica layer, and silica layer
SAMSUNG SDI CO LTD0 citations39
US10153171B2Dec 11, 2018
Method of forming patterns, patterns formed according to the method, and semiconductor device including the patterns
SAMSUNG SDI CO LTD0 citations37
US10804095B2Oct 13, 2020
Composition for forming silica layer, silica layer, and electronic device
SAMSUNG SDI CO LTD0 citations36
CHEIL IND INC
3 patentsUS9738787B2Aug 22, 2017
Composition for forming silica-based insulating layer, method for preparing composition for forming silica-based insulating layer, silica-based insulating layer, and method for manufacturing silica-based insulating layer
CHEIL IND INC0 citations51
US8383737B2Feb 26, 2013
Compound for gap-filling of semiconductor device and coating composition using the same
CHEIL IND INC0 citations50
US9890255B2Feb 13, 2018
Modified hydrogenated polysiloxazane, composition comprising same for forming silica-based insulation layer, method for preparing composition for forming
CHEIL IND INC0 citations49
LIM SANG-HAK
2 patentsUS8058711B2Nov 15, 2011
Filler for filling a gap and method for manufacturing semiconductor capacitor using the same
LIM SANG-HAK10 citations80
US9096726B2Aug 4, 2015
Composition for forming silica based insulating layer, method for manufacturing composition for forming silica based insulating layer, silica based insulating layer and method for manufacturing silica based insulating layer
LIM SANG-HAK3 citations59
SAMSUNG DISPLAY CO LTD
2 patentsBAE JIN-HEE
2 patentsUS9312122B2Apr 12, 2016
Rinse liquid for insulating film and method of rinsing insulating film
BAE JIN-HEE0 citations33
US9240443B2Jan 19, 2016
Process of preparing a gap filler agent, a gap filler agent prepared using same, and a method for manufacturing semiconductor capacitor using the gap filler agent
BAE JIN-HEE0 citations33