Inventor
HEGDE GANESH
US20 patents
⚠️ This page may combine multiple inventors who share the name “HEGDE GANESH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
14 patentsUS9831323B2Nov 28, 2017
Structure and method to achieve compressively strained Si NS
SAMSUNG ELECTRONICS CO LTD8 citations82
US10381315B2Aug 13, 2019
Method and system for providing a reverse-engineering resistant hardware embedded security module
SAMSUNG ELECTRONICS CO LTD2 citations73
US9634140B2Apr 25, 2017
Fabricating metal source-drain stressor in a MOS device channel
SAMSUNG ELECTRONICS CO LTD4 citations73
US9613907B2Apr 4, 2017
Low resistivity damascene interconnect
SAMSUNG ELECTRONICS CO LTD4 citations73
US11586982B2Feb 21, 2023
Electronic and atomic structure computation utilizing machine learning
SAMSUNG ELECTRONICS CO LTD3 citations72
US11537898B2Dec 27, 2022
Generative structure-property inverse computational co-design of materials
SAMSUNG ELECTRONICS CO LTD5 citations72
US11043454B2Jun 22, 2021
Low resistivity interconnects with doped barrier layer for integrated circuits
SAMSUNG ELECTRONICS CO LTD3 citations72
US11087055B2Aug 10, 2021
Method of screening materials using forward conducting modes
SAMSUNG ELECTRONICS CO LTD3 citations71
US11289419B2Mar 29, 2022
Interconnects having long grains and methods of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US10916513B2Feb 9, 2021
Method and system for providing a reverse engineering resistant hardware embedded security module
SAMSUNG ELECTRONICS CO LTD0 citations62
US10763207B2Sep 1, 2020
Interconnects having long grains and methods of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations51
US10510886B2Dec 17, 2019
Method of providing reacted metal source-drain stressors for tensile channel stress
SAMSUNG ELECTRONICS CO LTD0 citations41
US10510665B2Dec 17, 2019
Low-k dielectric pore sealant and metal-diffusion barrier formed by doping and method for forming the same
SAMSUNG ELECTRONICS CO LTD0 citations40
US9728502B2Aug 8, 2017
Metal oxysilicate diffusion barriers for damascene metallization with low RC delays and methods for forming the same
SAMSUNG ELECTRONICS CO LTD0 citations40
PURDUE RESEARCH FOUNDATION
3 patentsUS9858365B2Jan 2, 2018
Physical modeling of electronic devices/systems
PURDUE RESEARCH FOUNDATION3 citations68
US10311179B2Jun 4, 2019
Physical modeling of electronic devices/systems
PURDUE RESEARCH FOUNDATION0 citations48
US10061877B2Aug 28, 2018
Physical modeling of electronic devices/systems
PURDUE RESEARCH FOUNDATION0 citations48