P

Inventor

HEGDE GANESH

US20 patents
⚠️ This page may combine multiple inventors who share the name “HEGDE GANESH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG ELECTRONICS CO LTD

14 patents
US9831323B2Nov 28, 2017

Structure and method to achieve compressively strained Si NS

SAMSUNG ELECTRONICS CO LTD8 citations82
US10381315B2Aug 13, 2019

Method and system for providing a reverse-engineering resistant hardware embedded security module

SAMSUNG ELECTRONICS CO LTD2 citations73
US9634140B2Apr 25, 2017

Fabricating metal source-drain stressor in a MOS device channel

SAMSUNG ELECTRONICS CO LTD4 citations73
US9613907B2Apr 4, 2017

Low resistivity damascene interconnect

SAMSUNG ELECTRONICS CO LTD4 citations73
US11586982B2Feb 21, 2023

Electronic and atomic structure computation utilizing machine learning

SAMSUNG ELECTRONICS CO LTD3 citations72
US11537898B2Dec 27, 2022

Generative structure-property inverse computational co-design of materials

SAMSUNG ELECTRONICS CO LTD5 citations72
US11043454B2Jun 22, 2021

Low resistivity interconnects with doped barrier layer for integrated circuits

SAMSUNG ELECTRONICS CO LTD3 citations72
US11087055B2Aug 10, 2021

Method of screening materials using forward conducting modes

SAMSUNG ELECTRONICS CO LTD3 citations71
US11289419B2Mar 29, 2022

Interconnects having long grains and methods of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US10916513B2Feb 9, 2021

Method and system for providing a reverse engineering resistant hardware embedded security module

SAMSUNG ELECTRONICS CO LTD0 citations62
US10763207B2Sep 1, 2020

Interconnects having long grains and methods of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations51
US10510886B2Dec 17, 2019

Method of providing reacted metal source-drain stressors for tensile channel stress

SAMSUNG ELECTRONICS CO LTD0 citations41
US10510665B2Dec 17, 2019

Low-k dielectric pore sealant and metal-diffusion barrier formed by doping and method for forming the same

SAMSUNG ELECTRONICS CO LTD0 citations40
US9728502B2Aug 8, 2017

Metal oxysilicate diffusion barriers for damascene metallization with low RC delays and methods for forming the same

SAMSUNG ELECTRONICS CO LTD0 citations40

PURDUE RESEARCH FOUNDATION

3 patents

KITTL JORGE A

2 patents

INCONTACT INC

1 patent