Inventor
CHEN CHEN-AN
US37 patents
⚠️ This page may combine multiple inventors who share the name “CHEN CHEN-AN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
27 patentsUS6998014B2Feb 14, 2006
Apparatus and method for plasma assisted deposition
APPLIED MATERIALS INC167 citations98
US6486082B1Nov 26, 2002
CVD plasma assisted lower dielectric constant sicoh film
APPLIED MATERIALS INC80 citations98
US6024799AFeb 15, 2000
Chemical vapor deposition manifold
APPLIED MATERIALS INC673 citations98
US6387207B1May 14, 2002
Integration of remote plasma generator with semiconductor processing chamber
APPLIED MATERIALS INC944 citations97
US6591850B2Jul 15, 2003
Method and apparatus for fluid flow control
APPLIED MATERIALS INC68 citations96
US6303501B1Oct 16, 2001
Gas mixing apparatus and method
APPLIED MATERIALS INC66 citations96
US6066836AMay 23, 2000
High temperature resistive heater for a process chamber
APPLIED MATERIALS INC80 citations95
US6902629B2Jun 7, 2005
Method for cleaning a process chamber
APPLIED MATERIALS INC32 citations92
US6506994B2Jan 14, 2003
Low profile thick film heaters in multi-slot bake chamber
APPLIED MATERIALS INC22 citations92
US6267820B1Jul 31, 2001
Clog resistant injection valve
APPLIED MATERIALS INC16 citations92
US6261374B1Jul 17, 2001
Clog resistant gas delivery system
APPLIED MATERIALS INC27 citations92
US6068703AMay 30, 2000
Gas mixing apparatus and method
APPLIED MATERIALS INC51 citations92
US5948958ASep 7, 1999
Method and apparatus for verifying the calibration of semiconductor processing equipment
APPLIED MATERIALS INC24 citations92
US6358327B1Mar 19, 2002
Method for endpoint detection using throttle valve position
APPLIED MATERIALS INC74 citations91
US6709721B2Mar 23, 2004
Purge heater design and process development for the improvement of low k film properties
APPLIED MATERIALS INC14 citations84
US6596343B1Jul 22, 2003
Method and apparatus for processing semiconductor substrates with hydroxyl radicals
APPLIED MATERIALS INC13 citations84
US7779784B2Aug 24, 2010
Apparatus and method for plasma assisted deposition
APPLIED MATERIALS INC8 citations83
US6943127B2Sep 13, 2005
CVD plasma assisted lower dielectric constant SICOH film
APPLIED MATERIALS INC6 citations74
US6379492B2Apr 30, 2002
Corrosion resistant coating
APPLIED MATERIALS INC9 citations73
US6235120B1May 22, 2001
Coating for parts used in semiconductor processing chambers
APPLIED MATERIALS INC7 citations73
US7153787B2Dec 26, 2006
CVD plasma assisted lower dielectric constant SICOH film
APPLIED MATERIALS INC3 citations63
US6110284AAug 29, 2000
Apparatus and a method for shielding light emanating from a light source heating a semicondutor processing chamber
APPLIED MATERIALS INC4 citations63
US12365986B2Jul 22, 2025
Remote capacitively coupled plasma deposition of amorphous silicon
APPLIED MATERIALS INC0 citations62
US6793965B2Sep 21, 2004
Clog resistant injection valve
APPLIED MATERIALS INC4 citations62
US12009185B2Jun 11, 2024
Semiconductor processing apparatus having improved temperature control
APPLIED MATERIALS INC0 citations52
US7947131B2May 24, 2011
Copper deposition chamber having integrated bevel clean with edge bevel removal detection
APPLIED MATERIALS INC1 citations52
US6346481B1Feb 12, 2002
Method of reducing pitting of a coated heater
APPLIED MATERIALS INC0 citations52