Inventor
CHANG TIEN-SHUN
TW18 patents
Patents
18 patentsUS10115808B2Oct 30, 2018
finFET device and methods of forming
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US11670683B2Jun 6, 2023
Semiconductor device with implant and method of manufacturing same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11450757B2Sep 20, 2022
FinFET device and methods of forming
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10770570B2Sep 8, 2020
FinFET device and methods of forming
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10510619B2Dec 17, 2019
Semiconductor structure and method for manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations71
US12484240B2Nov 25, 2025
Semiconductor device and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12419099B2Sep 16, 2025
Method for manufacturing semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12100738B2Sep 24, 2024
Semiconductor device with implant and method of manufacturing same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11984322B2May 14, 2024
Semiconductor device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11935793B2Mar 19, 2024
Dual dopant source/drain regions and methods of forming same
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11640986B2May 2, 2023
Implantation and annealing for semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11367621B2Jun 21, 2022
Semiconductor device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11088249B2Aug 10, 2021
Semiconductor device with implant and method of manufacturing same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11056573B2Jul 6, 2021
Implantation and annealing for semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12563997B2Feb 24, 2026
Warm wafer after ion cryo-implantation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10714344B2Jul 14, 2020
Mask formation by selectively removing portions of a layer that have not been implanted
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10460940B2Oct 29, 2019
Mask formation by selectively removing portions of a layer that have not been implanted
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12368018B2Jul 22, 2025
Method for ion implantation uniformity control
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49