Inventor
LOWELL JOHN K
US10 patents
Patents
10 patentsUS5778039AJul 7, 1998
Method and apparatus for the detection of light elements on the surface of a semiconductor substrate using x-ray fluorescence (XRF)
ADVANCED MICRO DEVICES INC141 citations97
US5963783AOct 5, 1999
In-line detection and assessment of net charge in PECVD silicon dioxide (oxide) layers
ADVANCED MICRO DEVICES INC52 citations96
US5907764AMay 25, 1999
In-line detection and assessment of net charge in PECVD silicon dioxide (oxide) layers
ADVANCED MICRO DEVICES INC25 citations92
US5657363AAug 12, 1997
Method and apparatus for determining the thickness and elemental composition of a thin film using radioisotopic X-ray fluorescence (RXRF)
ADVANCED MICRO DEVICES INC43 citations92
US5581194ADec 3, 1996
Method and apparatus for passive optical characterization of semiconductor substrates subjected to high energy (MEV) ion implantation using high-injection surface photovoltage
ADVANCED MICRO DEVICES INC38 citations92
US5804981ASep 8, 1998
Method of detecting heavy metal impurities introduced into a silicon wafer during ion implantation
ADVANCED MICRO DEVICES INC31 citations86
US5557409ASep 17, 1996
Characterization of an external silicon interface using optical second harmonic generation
ADVANCED MICRO DEVICES INC39 citations84
US5471293ANov 28, 1995
Method and device for determining defects within a crystallographic substrate
ADVANCED MICRO DEVICES INC19 citations77
US5891743AApr 6, 1999
Method of forming buried oxygen layer using MeV ion implantation
ADVANCED MICRO DEVICES INC6 citations62
US6190518B1Feb 20, 2001
Device for reducing plasma etch damage and method for manufacturing same
ADVANCED MICRO DEVICES INC6 citations56