Inventor

WU BANQIU

US45 patents

⚠️ This page may combine multiple inventors who share the name “WU BANQIU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WU BANQIU

APPLIED MATERIALS INC

Atomic layer deposition lithography

Method of etching extreme ultraviolet light (EUV) photomasks

Method and apparatus for mask pellicle adhesive residue cleaning

Methods and apparatus for controlling photoresist line width roughness with enhanced electron spin control

Apparatus and methods for fabricating a photomask substrate for EUV applications

Methods for the continuous processing of substrates

Methods for reducing line width roughness and/or critical dimension nonuniformity in a patterned photoresist layer

Methods and apparatus for photomask processing

Ultraviolet and ozone clean system

Photomask having self-masking layer and methods of etching same

Intelligent processing tools

Intelligent processing tools

Ultraviolet and ozone clean system

Megasonic clean with cavity property monitoring

Megasonic clean with cavity property monitoring

Method for removing photoresist from photomask substrate

Portion of layer removal at substrate edge

Photomask pellicle glue residue removal

Photomask pellicle glue residue removal

Method and apparatus for high throughput photomask curing

Attachment feature removal from photomask in extreme ultraviolet lithography application

Photoresist treatment method by low bombardment plasma

Electrodes for etch

Ultraviolet and ozone cleaning apparatus and method of using

Baking chamber with shroud for mask clean

Atomic oxygen and ozone cleaning device having a temperature control apparatus

Single-volume baking chamber for mask clean

Atomic oxygen and ozone device for cleaning and surface treatment

Multi-volume baking chamber for mask clean

Pellicle adhesive residue removal system and methods

Photomask laser etch

Methods for in-situ chamber clean in plasma etching processing chamber

WU BANQIU

Methods for controlling defects for extreme ultraviolet lithography (EUVL) photomask substrate

3D IC computer system

Cost-effective cooling method for computer system

Methods and apparatus for performing multiple photoresist layer development and etching processes

Continuous substrate processing system

Contamination prevention in extreme ultraviolet lithography

Cooling method for a 3D IC computer system

Methods and apparatus for controlling photoresist line width roughness

UNIV ALABAMA

Production, refining and recycling of lightweight and reactive metals in ionic liquids

Production, refining and recycling of lightweight and reactive metals in ionic liquids

Production of metal/refractory composites by bubbling gas through a melt

YALAMANCHILI MADHAVA RAO

In-situ deposited mask layer for device singulation by laser scribing and plasma etch

(unassigned)

Ionic liquid temperature sensor