Inventor

GRAUR IOANA

US25 patents

⚠️ This page may combine multiple inventors who share the name “GRAUR IOANA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GRAUR IOANA

IBM

Generating mask patterns for alternating phase-shift mask lithography

Phase-width balanced alternating phase shift mask design

Alternating phase shift mask design with optimized phase shapes

Priority coloring for VLSI designs

Closed-loop design for manufacturability process

System for coloring a partially colored design in an alternating phase shift mask

System for coloring a partially colored design in an alternating phase shift mask

Priority coloring for VLSI designs

Local coloring for hierarchical OPC

Designer&#39;s intent tolerance bands for proximity correction and checking

Designer&#39;s intent tolerance bands for proximity correction and checking

Methodology for image fidelity verification

Method of conflict avoidance in fabrication of gate-shrink alternating phase shifting masks

Alternating phase shift mask design with optimized phase shapes

Generating mask patterns for alternating phase-shift mask lithography

Methodology for image fidelity verification

Pattern improvement in multiprocess patterning

Photomask error correction

GRAUR IOANA

Short path customized mask correction

Calibration of lithographic process models

TIRAPU AZPIROZ JAIONE

Efficient isotropic modeling approach to incorporate electromagnetic effects into lithographic process simulations

GLOBALFOUNDRIES INC

Test patterns for determining sizing and spacing of sub-resolution assist features (SRAFs)

MANSFIELD SCOTT M

Photomask design verification

MUKHERJEE MAHARAJ

Method and system for obtaining bounds on process parameters for OPC-verification

DUNN DERREN N

Pattern improvement in multiprocess patterning

Designer's intent tolerance bands for proximity correction and checking

Designer's intent tolerance bands for proximity correction and checking