Inventor
KIM HEE-BOM
KR24 patents
⚠️ This page may combine multiple inventors who share the name “KIM HEE-BOM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
15 patentsUS7865866B2Jan 4, 2011
Method of inspecting mask using aerial image inspection apparatus
SAMSUNG ELECTRONICS CO LTD10 citations76
US10437143B2Oct 8, 2019
Pellicle for exposure to extreme ultraviolet light, photomask assembly, and method of manufacturing the pellicle
SAMSUNG ELECTRONICS CO LTD3 citations70
US11067887B2Jul 20, 2021
Apparatus for manufacturing pellicle
SAMSUNG ELECTRONICS CO LTD0 citations62
US7525089B2Apr 28, 2009
Method of measuring a critical dimension of a semiconductor device and a related apparatus
SAMSUNG ELECTRONICS CO LTD5 citations62
US7642017B2Jan 5, 2010
Reflective photomask, method of fabricating the same, and reflective blank photomask
SAMSUNG ELECTRONICS CO LTD3 citations61
US7601467B2Oct 13, 2009
Method of manufacturing EUVL alternating phase-shift mask
SAMSUNG ELECTRONICS CO LTD2 citations61
US7745072B2Jun 29, 2010
Method of correcting critical dimension in photomask and photomask having corrected critical dimension using the method
SAMSUNG ELECTRONICS CO LTD4 citations60
US11281093B2Mar 22, 2022
Systems and methods using mask pattern measurements performed with compensated light signals
SAMSUNG ELECTRONICS CO LTD0 citations59
US11061322B2Jul 13, 2021
Systems and methods using mask pattern measurements performed with compensated light signals
SAMSUNG ELECTRONICS CO LTD0 citations59
US10747104B2Aug 18, 2020
Method of manufacturing pellicle and apparatus for assembling pellicle
SAMSUNG ELECTRONICS CO LTD0 citations51
US7736838B2Jun 15, 2010
Methods for forming pattern using electron beam and cell masks used in electron beam lithography
SAMSUNG ELECTRONICS CO LTD0 citations51
US7897299B2Mar 1, 2011
Phase-shift mask and method of forming the same
SAMSUNG ELECTRONICS CO LTD1 citations49
US7754398B2Jul 13, 2010
Photo mask having assist pattern and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD0 citations49
US7745068B2Jun 29, 2010
Binary photomask having a compensation layer
SAMSUNG ELECTRONICS CO LTD1 citations49
US7939223B2May 10, 2011
Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method
SAMSUNG ELECTRONICS CO LTD0 citations40
CHOI JIN
3 patentsUS8673522B2Mar 18, 2014
Method for manufacturing photomask and photomask manufactured using the same
CHOI JIN0 citations51
US8475980B2Jul 2, 2013
Methods of forming semiconductor devices using photolithographic shot grouping
CHOI JIN1 citations51
US8329381B2Dec 11, 2012
Pattern forming method
CHOI JIN0 citations51